DocumentCode :
1512825
Title :
Temperature dependence characterization of effective electron and hole mobilities in the accumulation layers of n- and p-type MOSFET´s
Author :
Chindalore, G. ; Mudanai, S. ; Shih, W.K. ; Tasch, A.F., Jr. ; Maziar, C.M.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Volume :
46
Issue :
6
fYear :
1999
fDate :
6/1/1999 12:00:00 AM
Firstpage :
1290
Lastpage :
1294
Abstract :
Experimental results for the MOS electron and hole accumulation layer mobilities (μacc), measured for a wide range of doping concentrations (1×1016 cm-3-4×1017 cm-3) and at temperatures ranging from 25°C to 150°C, indicate a “universal behavior” at high effective fields and over the temperature range of the measurement, similar to that of MOS inversion carriers. At low to moderate transverse fields, μacc is found to be greater than the bulk mobility at lower temperatures, and gradually decreases toward the bulk mobility values with the increasing lattice temperature. However, for lower doping levels, μacc is found to be lower than the bulk mobility values at all temperatures and effective fields
Keywords :
MOSFET; accumulation layers; electron mobility; hole mobility; semiconductor device measurement; 25 to 150 C; accumulation layers; doping concentrations; effective electron mobility; effective hole mobility; lattice temperature; n-type MOSFET; p-type MOSFET; temperature dependence characterization; Charge carrier processes; Doping; Electron mobility; Fabrication; Lattices; MOS devices; MOSFET circuits; Microelectronics; Temperature dependence; Temperature distribution;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.766900
Filename :
766900
Link To Document :
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