• DocumentCode
    1513653
  • Title

    RESURF AlGaN/GaN HEMT for high voltage power switching

  • Author

    Karmalkar, Shreepad ; Jianyu Deng ; Shur, Michael S.

  • Author_Institution
    Dept. of Electr. Eng., Indian Inst. of Technol., Madras, India
  • Volume
    22
  • Issue
    8
  • fYear
    2001
  • Firstpage
    373
  • Lastpage
    375
  • Abstract
    A novel HEMT configuration based on the RESURF technique is proposed for very high voltage power switching applications. It employs a p-n junction below the 2-DEG channel and two field plates, one extending from the gate and the other from the drain, to distribute the electric field over the gate to drain separation. 2-D simulations indicate a breakdown voltage >1 KV at on-resistance of /spl sim/1 m/spl Omega//spl middot/cm/sup 2/ (neglecting contact resistances) for the device.
  • Keywords
    III-V semiconductors; aluminium compounds; field effect transistor switches; gallium compounds; power HEMT; power semiconductor switches; semiconductor device breakdown; wide band gap semiconductors; 1 kV; 2D simulation; 2DEG channel; AlGaN-GaN; RESURF AlGaN/GaN HEMT; breakdown voltage; electric field distribution; field plate; high voltage power switching; on-resistance; p-n junction; Aluminum gallium nitride; Breakdown voltage; Doping; FETs; Gallium nitride; HEMTs; Heterojunctions; Insulation; P-n junctions; Physics;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.936347
  • Filename
    936347