DocumentCode :
1513659
Title :
High-frequency measurements of AlGaN/GaN HEMTs at high temperatures
Author :
Akita, M. ; Kishimoto, S. ; Mizutani, T.
Author_Institution :
Dept. of Quantum Eng., Nagoya Univ., Japan
Volume :
22
Issue :
8
fYear :
2001
Firstpage :
376
Lastpage :
377
Abstract :
High-frequency measurements of the 1.3-μm-long gate AlGaN-GaN HEMTs have been performed at temperatures ranging from 23 to 187/spl deg/C. The cutoff frequency fT decreased with increasing temperature. It was 13.7 and 8.7 GHz at 23 and 187/spl deg/C, respectively. The effective electron velocities /spl upsi//sub eff/ in the channel evaluated from the total delay time versus I/sub D/-inverse relation were 1.2 and 0.8×10/sup 7/ cm/s at 23 and 187/spl deg/C, respectively.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high-temperature electronics; microwave field effect transistors; microwave power transistors; power HEMT; semiconductor device measurement; wide band gap semiconductors; 1.3 micron; 23 to 187 C; 8.7 to 13.7 GHz; AlGaN-GaN; AlGaN/GaN HEMTs; HF measurements; cutoff frequency; effective electron velocities; high temperatures; high-frequency measurements; Aluminum gallium nitride; Cutoff frequency; Delay effects; Electrons; Gallium nitride; HEMTs; MODFETs; Performance evaluation; Temperature distribution; Temperature measurement;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.936348
Filename :
936348
Link To Document :
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