DocumentCode
1513659
Title
High-frequency measurements of AlGaN/GaN HEMTs at high temperatures
Author
Akita, M. ; Kishimoto, S. ; Mizutani, T.
Author_Institution
Dept. of Quantum Eng., Nagoya Univ., Japan
Volume
22
Issue
8
fYear
2001
Firstpage
376
Lastpage
377
Abstract
High-frequency measurements of the 1.3-μm-long gate AlGaN-GaN HEMTs have been performed at temperatures ranging from 23 to 187/spl deg/C. The cutoff frequency fT decreased with increasing temperature. It was 13.7 and 8.7 GHz at 23 and 187/spl deg/C, respectively. The effective electron velocities /spl upsi//sub eff/ in the channel evaluated from the total delay time versus I/sub D/-inverse relation were 1.2 and 0.8×10/sup 7/ cm/s at 23 and 187/spl deg/C, respectively.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high-temperature electronics; microwave field effect transistors; microwave power transistors; power HEMT; semiconductor device measurement; wide band gap semiconductors; 1.3 micron; 23 to 187 C; 8.7 to 13.7 GHz; AlGaN-GaN; AlGaN/GaN HEMTs; HF measurements; cutoff frequency; effective electron velocities; high temperatures; high-frequency measurements; Aluminum gallium nitride; Cutoff frequency; Delay effects; Electrons; Gallium nitride; HEMTs; MODFETs; Performance evaluation; Temperature distribution; Temperature measurement;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.936348
Filename
936348
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