Title : 
High-performance, graded-base AlGaAs/InGaAs collector-up heterojunction bipolar transistors using a novel selective area regrowth process
         
        
            Author : 
Tseng, H.C. ; Ye, Y.Z.
         
        
            Author_Institution : 
Microelectron. Centre, Harbin Inst. of Technol., China
         
        
        
        
        
            fDate : 
6/1/1999 12:00:00 AM
         
        
        
        
            Abstract : 
Graded-base AlGaAs/InGaAs collector-up heterojunction bipolar transistors (C-up HBTs) were successfully fabricated using a novel selective area regrowth process to reduce the base resistance and their dc and microwave performances were evaluated. The base is compositionally graded to provide a quasi-built-in field which decreases the base transit time for high-frequency response and increases the base transport factor at low-temperature operation. A unity-gain cutoff frequency fT=55 GHz and a maximum frequency of oscillation fmax=74 GHz for the C-up n-p-n HBT, and an fT=48 GHz and an fmax= 39 GHz for the C-up p-n-p HBT were obtained for devices with a 5-μm×10-μm collector area. The nonself-aligned C-up HBT´s reported here show great promise for future high-speed C-up complementary bipolar IC´s.
         
        
            Keywords : 
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; 39 to 74 GHz; AlGaAs-InGaAs; DC characteristics; base resistance; base transit time; base transport factor; graded-base AlGaAs/InGaAs collector-up heterojunction bipolar transistor; microwave characteristics; nonself-aligned C-up HBT; quasi-built-in field; selective area regrowth; Bipolar transistors; Buffer layers; Cutoff frequency; Etching; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Indium gallium arsenide; Microelectronics; Molecular beam epitaxial growth;
         
        
        
            Journal_Title : 
Electron Device Letters, IEEE