• DocumentCode
    1513898
  • Title

    Comparison of reactor performance in the nonthermal plasma chemical processing of hazardous air pollutants

  • Author

    Futamura, Shigeru ; Einaga, Hisahiro ; Zhang, Aihua

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol., Ibaraki, Japan
  • Volume
    37
  • Issue
    4
  • fYear
    2001
  • Firstpage
    978
  • Lastpage
    985
  • Abstract
    The performance of three different types of plasma reactors such as ferroelectric packed-bed (FPR), pulsed corona (PCR), and silent discharge (SDR) were compared in the decomposition of trichloroethylene (Cl2C=CHCl, TCE), bromomethane (CH3Br), and tetrafluoromethane (CF4). Irrespective of reactors, hazardous air pollutant (HAP) reactivity in dry N2 decreased in the order: TCE>CH3Br>CF4. Similar byproducts were obtained with any of the above reactors, and similar trends were observed in the HAP decomposition rate-retarding effect by water. Only for SDR, TCE decomposition was accelerated by O2 in the background gas. The most plausible active oxygen species is considered to be the triplet oxygen atom. In the reaction systems where chemically induced decomposition of HAPs can occur, as in the case of TCE, PCR is expected to exceed FPR and SDR in performance. In the cases of CH3 Br and CF4, residence time has been the most important factor governing their decomposition rates, and FPR and SDR have shown higher performance than PCR
  • Keywords
    corona; decomposition; ferroelectric devices; oxygen; plasma materials processing; waste disposal; active oxygen species; bromomethane decomposition; decomposition rate; ferroelectric packed-bed reactor; hazardous air pollutants; nonthermal plasma chemical processing; pulsed corona reactor; reactor performance comparison; silent discharge reactor; tetrafluoromethane decomposition; trichloroethylene decomposition; triplet oxygen atom; Air pollution; Chemical hazards; Chemical processes; Chemical reactors; Ferroelectric materials; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/28.936387
  • Filename
    936387