DocumentCode :
1514067
Title :
Electrical properties and transport mechanisms of InP/InGaAs HBTs operated at low temperature
Author :
Wang, Hong ; Ng, Geok Ing
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
Volume :
48
Issue :
8
fYear :
2001
fDate :
8/1/2001 12:00:00 AM
Firstpage :
1492
Lastpage :
1497
Abstract :
The electrical properties of InP/InGaAs HBTs have been comprehensively investigated between room and near liquid helium temperature. Physical mechanisms for the devices operated in different temperature ranges have been clearly identified. The low temperature measurements indicate that, in the temperature range of 240 K to 300 K, the base current is dominated by electron-hole band-to-band recombination; in the temperature range 77 K to 240 K, trap-related recombination (Shockley-Read-Hall recombination) plays an important role in determining base current; and for temperature lower than 77 K, the collector and base currents are found to be limited by electron tunneling through the barrier formed by the conduction-band discontinuity at the E-B junction. These findings provide us with better physical insight of the device operation at low temperature, which is particularly important for the optimization of InP HBT technology for low temperature applications as well as the development of a quantitative model for circuit design
Keywords :
III-V semiconductors; cryogenic electronics; electron-hole recombination; gallium arsenide; heterojunction bipolar transistors; indium compounds; interface states; semiconductor device measurement; 4.2 to 300 K; InP HBT technology; InP-InGaAs; InP/InGaAs HBTs; Shockley-Read-Hall recombination; base current; circuit design; collector current; conduction-band discontinuity; electrical properties; electron tunneling; electron-hole band-to-band recombination; liquid helium temperature; low temperature operation; transport mechanisms; trap-related recombination; Design optimization; Electron traps; Helium; Indium gallium arsenide; Indium phosphide; Mechanical factors; Spontaneous emission; Temperature distribution; Temperature measurement; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.936496
Filename :
936496
Link To Document :
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