DocumentCode :
1515212
Title :
Analytical Approximation for the Surface Potential in n-Channel MOSFETs Considering Quantum–Mechanical Effects
Author :
Jayadeva, G.S. ; DasGupta, Amitava
Author_Institution :
Dept. of Electr. Eng., IIT Madras, Chennai, India
Volume :
57
Issue :
8
fYear :
2010
Firstpage :
1820
Lastpage :
1828
Abstract :
A physics-based analytical model for the surface potential in n-channel MOSFETs considering quantum-mechanical effects in the inversion region is presented. The model is continuous from the accumulation to strong inversion regions of operation. The results from the model show excellent agreement with the values obtained from a self-consistent solution of the Schrödinger and Poisson equations. The transconductance and current-voltage characteristics of MOSFETs obtained using the surface-potential values calculated from our model also agree very well with those obtained from numerical methods and reported data.
Keywords :
MOSFET; Poisson equation; Schrodinger equation; surface potential; Poisson equation; Schrodinger equation; analytical model; current-voltage characteristic; inversion region; nchannel MOSFET; quantum mechanical effects; surface potential values; transconductance characteristic; Analytical models; Helium; MOSFETs; Poisson equations; Potential well; Quantum mechanics; Semiconductor device doping; Semiconductor process modeling; Smoothing methods; Transconductance; Analytical model; nMOSFETs; quantum–mechanical (QM) effect; surface potential;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2050959
Filename :
5484427
Link To Document :
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