• DocumentCode
    1515327
  • Title

    Fundamental Limitations to the Width of the Programmed V_{T} Distribution of nor Flash Memories

  • Author

    Compagnoni, Christian Monzio ; Chiavarone, Luca ; Calabrese, Marcello ; Ghidotti, Michele ; Lacaita, Andrea L. ; Spinelli, Alessandro S. ; Visconti, Angelo

  • Author_Institution
    Dipt. di Elettron. e Inf., Politec. di Milano, Milan, Italy
  • Volume
    57
  • Issue
    8
  • fYear
    2010
  • Firstpage
    1761
  • Lastpage
    1767
  • Abstract
    This paper presents experimental evidences of the granular electron injection during channel hot-electron programming of NOR Flash memories. The statistical process ruling the discrete charge transfer from the substrate to the floating gate is shown to introduce a fundamental spread contribution to the programmed threshold-voltage distribution obtained by the staircase algorithm, determining its ultimate accuracy. However, the actual precision in the control of cell threshold-voltage during programming is shown to be quite far from this fundamental limitation due to random telegraph noise effects. Moreover, the scaling trend of the electron injection statistics and the random telegraph noise limitation to the accuracy of the programming algorithm shows that the latter will continue to represent the most severe constraint for the next nor technology nodes.
  • Keywords
    NOR circuits; charge exchange; flash memories; random noise; statistical analysis; voltage distribution; NOR flash memories; channel hot-electron programming; discrete charge transfer; electron injection statistics; granular electron injection; programmed VT distribution; programmed threshold-voltage distribution; random telegraph noise effects; staircase algorithm; statistical process; Charge transfer; Electrons; Flash memory; Nanoelectronics; Nonvolatile memory; Parallel programming; Pulse measurements; Semiconductor device noise; Statistical distributions; Telegraphy; Electron injection statistics; Flash memories; random telegraph noise (RTN); semiconductor device modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2050543
  • Filename
    5484458