DocumentCode :
1517279
Title :
Optimized operations by extended X-factor theory including unit hours concept
Author :
Kishimoto, Mitsugu ; Ozawa, Katsutoshi ; Watanabe, Kinya ; Martin, Donald
Author_Institution :
Semicond. Operations, IBM Japan Ltd., Shiga, Japan
Volume :
14
Issue :
3
fYear :
2001
fDate :
8/1/2001 12:00:00 AM
Firstpage :
187
Lastpage :
195
Abstract :
The relationships between tool performance, cycle time, and throughput have been described to achieve the highest productivity. Though tool utilization is low for manually operated tools, long waits prior to product processing lead to a productivity loss in our production line. We focus on operator efficiency in the CMP (chemical mechanical polishing) operation, which, as a typical manually operated tool, influences cycle time. This paper introduces an online/offline unit hour analysis method, which has been designed to optimize operator allocation and headcount in our production line, using X-factor theory in order to achieve the shortest cycle time. By using online/offline unit hour analysis with X-factor theory, the root cause of waiting time can be identified and the relationship between operator headcount and cycle time can be described. The waiting time can be reduced by 35% and the cycle time can be reduced by 25%, according to a simulator with optimized operator allocation and headcount based on online/offline unit hour analysis
Keywords :
chemical mechanical polishing; integrated circuit manufacture; life cycle costing; optimisation; resource allocation; chemical mechanical polishing; cycle time; extended X-factor theory; headcount; manually operated tool; manually operated tools; operator allocation; operator efficiency; productivity; productivity loss; throughput; unit hours concept; waiting time; Analytical models; Chemicals; Design optimization; Dispatching; Equations; Fabrication; Production; Productivity; Semiconductor device manufacture; Throughput;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.939811
Filename :
939811
Link To Document :
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