DocumentCode :
1521769
Title :
High reproducibility for deep-quantum-well resonant tunnelling diodes grown by metal organic chemical vapour deposition
Author :
Mirabedini, A.R. ; Mawst, L.J. ; Botez, D. ; Marsland, R.A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
Volume :
35
Issue :
8
fYear :
1999
fDate :
4/15/1999 12:00:00 AM
Firstpage :
669
Lastpage :
670
Abstract :
Deep-quantum-well AlGaAs-InGaAs-GaAs resonant tunnelling diodes (RTDs), relying on resonant tunnelling through the second energy level of the quantum well, are found to have significantly lower sensitivity to the possible variations in thickness of the barriers than conventional devices: the peak current density of deep-quantum-well structures decreases by a factor of 1.48 for each monolayer increase in the total barrier thickness compared with a factor of 2.27 for state-of-the-art InP-based devices. Thus these structures can be fabricated much more reproducibly than conventional RTDs
Keywords :
III-V semiconductors; aluminium compounds; current density; gallium arsenide; indium compounds; quantum well devices; resonant tunnelling diodes; semiconductor quantum wells; AlGaAs-InGaAs-GaAs; chemical vapour deposition; deep QW device; deep-quantum-well RTD; high reproducibility; metal organic CVD; peak current density; resonant tunnelling diodes; second energy level; total barrier thickness;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19990446
Filename :
771024
Link To Document :
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