• DocumentCode
    1521911
  • Title

    Simple Method for Extracting Effective Sheet Charge Density Along STI Sidewalls Due to Radiation

  • Author

    Hu, Zhiyuan ; Liu, Zhangli ; Shao, Hua ; Zhang, Zhengxuan ; Ning, Bingxu ; Chen, Ming ; Bi, Dawei ; Zou, Shichang

  • Author_Institution
    Shanghai Inst. of Microsyst. & Inf. Technol., Chinese Acad. of Sci., Shanghai, China
  • Volume
    58
  • Issue
    3
  • fYear
    2011
  • fDate
    6/1/2011 12:00:00 AM
  • Firstpage
    1332
  • Lastpage
    1337
  • Abstract
    A first order model of radiation induced narrow-channel effect (RINCE) is developed by applying charge conservation principle to calculate threshold voltage shift due to total ionizing dose (TID) irradiation. The model provides a way for extracting effective sheet charge density along shallow trench isolation (STI) sidewalls.
  • Keywords
    CMOS integrated circuits; MOSFET; radiation effects; surface charging; RINCE; STI sidewalls; TID irradiation; charge conservation principle; effective sheet charge density; first order model; radiation induced narrow channel effect; shallow trench isolation sidewalls; threshold voltage shift; total ionizing dose; Degradation; Logic gates; MOSFETs; Radiation effects; Substrates; Threshold voltage; CMOS devices; RINCE; sheet charge density; total dose effects;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2011.2142323
  • Filename
    5771575