• DocumentCode
    1522707
  • Title

    Bias and W/L dependence of capacitive coupling coefficients in floating gate memory cells

  • Author

    Larcher, Luca ; Pavan, Paolo ; Albani, Lara ; Ghilardi, Tecla

  • Author_Institution
    Dipt. di Sci., Modena Univ., Italy
  • Volume
    48
  • Issue
    9
  • fYear
    2001
  • fDate
    9/1/2001 12:00:00 AM
  • Firstpage
    2081
  • Lastpage
    2089
  • Abstract
    In this paper, a complete study of capacitive coupling coefficients dependence on bias and W/L will be presented, including a review on classic methods to extract their value from electrical characterization. Capacitive coupling ratios have been usually adopted to model floating gate (FG) memory cells, in particular to deduce the value of FG potential. Now they re determined by means of a new model (recently proposed in the literature), starting from a new procedure to evaluate the FG potential. Results obtained with the new model will be compared to classic values. Particularly, their bias dependence (during write/read/erase of Flash memory cells) will be deeply investigated, thus demonstrating the limits of considering them constants, as is usually done. by analyzing their W/L dependence, we will deduce useful information on the effects of scaling and the role played by fringing capacitances. The most important methods reported in the literature to estimate the control gate and drain capacitive coupling ratios will be accurately reviewed, thus showing that such procedures are often cumbersome and inaccurate. It is worth noting that for the first time, αB and αS will be studied in detail
  • Keywords
    flash memories; bias dependence; capacitive coupling coefficient; compact model; electrical characteristics; flash memory cell; floating gate potential; parameter extraction; width/length dependence; Capacitance; Character generation; Circuit simulation; Flash memory cells; Helium; Information analysis; Instruction sets; Nonvolatile memory; Semiconductor device modeling; Semiconductor devices;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.944199
  • Filename
    944199