• DocumentCode
    1522783
  • Title

    Analysis of dual-gate LIGBT with gradual hole injection

  • Author

    Lee, You-Sang ; Lee, Byeong-Hoon ; Lee, Won-Oh ; Han, Min-Koo ; Choi, Yearn-Ik

  • Author_Institution
    Dept. of Electr. Eng., Seoul Nat. Univ., South Korea
  • Volume
    48
  • Issue
    9
  • fYear
    2001
  • fDate
    9/1/2001 12:00:00 AM
  • Firstpage
    2154
  • Lastpage
    2160
  • Abstract
    The device characteristics of a gradual hole injection dual-gate lateral insulated gate bipolar transistor (GHI-LIGBT) is analyzed with the experiment and two-dimensional (2-D) numerical simulation. The hole injection mechanism in the GHI-LIGBT is investigated in detail and the device characteristics of the GHI-LIGBT are studied in terms of the various device parameters such as the p+ injector length and the injection gate length. The hole injection characteristics and latch-up characteristics in the GHI-LIGBT are also presented as a function of temperature. The experimental results demonstrate that an on-state voltage drop in GHI-LIGBT is reduced by 1 V, compared with the conventional SA-LIGBT and the negative resistance regime is eliminated since the injection of holes is initiated at the lower anode voltage. It is also found that the low on-state voltage drop in the GHI-LIGBT can be achieved without sacrificing the inherent high switching speed in shorted anode (SA) LIGBT structures
  • Keywords
    equivalent circuits; insulated gate bipolar transistors; negative resistance; power semiconductor switches; power transistors; semiconductor device models; 2D numerical simulation; device characteristics; device parameters; dual-gate LIGBT; gradual hole injection; high switching speed; injection gate length; latch-up characteristics; lateral IGBT; lateral insulated gate bipolar transistor; negative resistance regime elimination; on-state voltage drop; p+ injector length; shorted anode LIGBT structures; Anodes; Conductivity; Impedance; Insulated gate bipolar transistors; Low voltage; Numerical simulation; Plasma temperature; Power integrated circuits; Spontaneous emission; Two dimensional displays;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.944210
  • Filename
    944210