Nanoprojection Lithography Using Self-Assembled Interference Modules for Manufacturing Plasmonic Gratings

Author

Chuang, Fang-Tzu ; Chen, Pai-Yen ; Jiang, Yu-Wei ; Farhat, Mohamed ; Chen, Hung-Hsin ; Chen, Yu-Cheng ; Lee, Si-Chen

Author_Institution

Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan

Volume

24

Issue

15

fYear

2012

Firstpage

1273

Lastpage

1275

Abstract

A new nanoprojection lithography (NPL) is proposed to manufacture plasmonic nanogratings. Here, low-cost self-assembly elastomeric polydimethylsiloxane wavy structures are used as the interference modules, with their periods and amplitudes largely controlled by the applied mechanical strain in the synthesis process. Well-defined plasmonic grating couplers with desired feature sizes and wavelengths of operation were obtained. This NPL may enable large-area and flash manufacturing of plasmonic nanogratings with tunable array periods.

Keywords

diffraction gratings; elastomers; nanolithography; nanophotonics; optical polymers; applied mechanical strain; low-cost self-assembly elastomeric polydimethylsiloxane wavy structures; nanoprojection lithography; plasmonic nanogratings; self-assembled interference modules; tunable array periods; Gratings; Interference; Lithography; Nanobioscience; Plasmons; Resists; Substrates; Nanoprojection lithography (NPL); plasmonic nanogratings; polydimethylsiloxane (PDMS);

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2012.2200248

Filename

6205604