DocumentCode
1526900
Title
Fabrication of poly-Si thick films by electrophoretic deposition
Author
Hossein-Babaei, F. ; Raissi-Dehkordi, B.
Author_Institution
Electr. Eng. Dept., K.N. Tossi Univ. of Technol., Tehran, Iran
Volume
37
Issue
17
fYear
2001
fDate
8/16/2001 12:00:00 AM
Firstpage
1090
Lastpage
1092
Abstract
The electrophoresis of silicon particles in acetone, and the electrophoretic deposition of poly-silicon thick films are reported for the first time. The anodic deposition of Si particles was achieved by applying DC electric fields of ~100 V/cm between two electrodes soaked in a semistable acetone suspension. Uniform layers were reproducibly formed on gold, graphite and silicon wafer anodes (substrates). The technique was successfully applied on substrates of complicated shapes
Keywords
electrophoretic coating techniques; elemental semiconductors; semiconductor growth; semiconductor thin films; silicon; thick films; 10 to 50 mum; Au; C; DC electric fields; Si; acetone; anodic deposition; complicated shape substrates; electrophoresis; electrophoretic deposition; gold substrate; graphite substrate; poly-Si thick films; polysilicon thick films; semistable acetone suspension; silicon particles; silicon wafer anodes; uniform layers;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20010723
Filename
948344
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