Fabrication of poly-Si thick films by electrophoretic deposition

The electrophoresis of silicon particles in acetone, and the electrophoretic deposition of poly-silicon thick films are reported for the first time. The anodic deposition of Si particles was achieved by applying DC electric fields of ~100 V/cm between two electrodes soaked in a semistable acetone suspension. Uniform layers were reproducibly formed on gold, graphite and silicon wafer anodes (substrates). The technique was successfully applied on substrates of complicated shapes