• DocumentCode
    1527717
  • Title

    Compensated Monte Carlo Collision Model for Particle-in-Cell Simulation in High-Pressure Plasmas

  • Author

    Wang, Hong-Guang ; Li, Yong-Dong ; Liu, Chun-Liang ; Zhou, Yan ; Liu, Mei-Qin

  • Author_Institution
    Key Lab. of Phys. Electron. & Devices of the Minist. of Educ., Xi´´an Jiaotong Univ., Xi´´an, China
  • Volume
    38
  • Issue
    8
  • fYear
    2010
  • Firstpage
    2062
  • Lastpage
    2068
  • Abstract
    The Monte Carlo collision (MCC) model is widely adopted to simulate discharge plasmas using the particle-in-cell (PIC) method; however, it has low efficiency in high-pressure plasmas because of the small time steps required due to the constraint of high collision frequency. To relax this time step constraint, a compensated Monte Carlo collision model (CMCC) is proposed which considers multiple collisions in a time step as a series of single collisions to compensate for the neglected collisions. The electron motion in a high-pressure He gas for various reduced electric fields E/N and the streamer formation process in a laser-triggered spark gap were simulated using the CMCC model. Simulation results showed that the CMCC model with long time step obtained reasonable electron velocity distribution, temperature, drift velocity, plasma density, and space-charge field. It was demonstrated that the CMCC model had high accuracy and high efficiency, particularly for PIC simulation in high-pressure plasmas.
  • Keywords
    Monte Carlo methods; plasma collision processes; plasma density; plasma pressure; plasma simulation; plasma transport processes; space charge; spark gaps; Monte Carlo collision model; drift velocity; electron motion; electron velocity distribution; high collision frequency; high-pressure He gas; high-pressure plasma; laser-triggered spark gap; particle-in-cell simulation; plasma density; plasma discharge simulation; space-charge field; streamer formation process; High-pressure plasma; Monte Carlo collision (MCC) model; particle-in-cell (PIC) simulation;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2010.2050338
  • Filename
    5499127