DocumentCode
1527717
Title
Compensated Monte Carlo Collision Model for Particle-in-Cell Simulation in High-Pressure Plasmas
Author
Wang, Hong-Guang ; Li, Yong-Dong ; Liu, Chun-Liang ; Zhou, Yan ; Liu, Mei-Qin
Author_Institution
Key Lab. of Phys. Electron. & Devices of the Minist. of Educ., Xi´´an Jiaotong Univ., Xi´´an, China
Volume
38
Issue
8
fYear
2010
Firstpage
2062
Lastpage
2068
Abstract
The Monte Carlo collision (MCC) model is widely adopted to simulate discharge plasmas using the particle-in-cell (PIC) method; however, it has low efficiency in high-pressure plasmas because of the small time steps required due to the constraint of high collision frequency. To relax this time step constraint, a compensated Monte Carlo collision model (CMCC) is proposed which considers multiple collisions in a time step as a series of single collisions to compensate for the neglected collisions. The electron motion in a high-pressure He gas for various reduced electric fields E/N and the streamer formation process in a laser-triggered spark gap were simulated using the CMCC model. Simulation results showed that the CMCC model with long time step obtained reasonable electron velocity distribution, temperature, drift velocity, plasma density, and space-charge field. It was demonstrated that the CMCC model had high accuracy and high efficiency, particularly for PIC simulation in high-pressure plasmas.
Keywords
Monte Carlo methods; plasma collision processes; plasma density; plasma pressure; plasma simulation; plasma transport processes; space charge; spark gaps; Monte Carlo collision model; drift velocity; electron motion; electron velocity distribution; high collision frequency; high-pressure He gas; high-pressure plasma; laser-triggered spark gap; particle-in-cell simulation; plasma density; plasma discharge simulation; space-charge field; streamer formation process; High-pressure plasma; Monte Carlo collision (MCC) model; particle-in-cell (PIC) simulation;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2010.2050338
Filename
5499127
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