Title :
Mechanisms of Low Noise and High Detectivity of p-GaN/i-ZnO/n-ZnO : Al-Heterostructured Ultraviolet Photodetectors
Author :
Lee, Ching-Ting ; Lin, Tzu-Shun ; Lee, Hsin-Ying
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Abstract :
The i-ZnO film and n-ZnO : Al film were deposited on n-GaN layer using vapor cooling condensation system and sputter, respectively. The dark current of the resulting p-GaN/i-ZnO/n-ZnO : Al-heterostructured photodetectors was 4.11 pA. The rejection ratio between ultraviolet wavelength at 360 nm and visible wavelength at 420 nm was 3.0 103 at a zero bias voltage. The low frequency noise exhibited the flicker noise (1/ f) behaviors. With a reverse bias of -5 V, the flicker noise power density was about 2.51 10-25 A2, which corresponded to the high detectivity of 1.71 1011cmHz 1/2 W -1. The flicker noise was the dominant noise source of the photodetectors.
Keywords :
II-VI semiconductors; III-V semiconductors; aluminium; gallium compounds; photodetectors; semiconductor device noise; sputtered coatings; ultraviolet detectors; wide band gap semiconductors; zinc compounds; GaN-ZnO-ZnO:Al; dark current; flicker noise; heterostructured ultraviolet photodetector; high detectivity photodetector; low noise photodetector; sputter deposition; vapor cooling condensation; voltage -5 V; wavelength 360 nm to 420 nm; 1f noise; Conductive films; Cooling; Photodetectors; Rapid thermal annealing; Semiconductor device noise; Semiconductor films; Voltage; Wavelength measurement; Zinc oxide; Detectivity; ZnO-based ultraviolet (UV) photodetectors; flicker noise; noise equivalent power; thermal noise;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2010.2050473