DocumentCode
1528421
Title
Analysis of SAW properties of epitaxial ZnO films grown on R-Al/sub 2/O/sub 3/ substrates
Author
Emanetoglu, Nuri W. ; Patounakis, George ; Liang, Shaohua ; Gorla, Chandrasekhar R. ; Wittstruck, Richard ; Lu, Yicheng
Author_Institution
Dept. of Electr. & Comput. Eng., Rutgers Univ., Piscataway, NJ, USA
Volume
48
Issue
5
fYear
2001
Firstpage
1389
Lastpage
1394
Abstract
ZnO thin films with a high piezoelectric coupling coefficient are widely used for high frequency and low loss surface acoustic wave (SAW) devices when the film is deposited on top of a high acoustic velocity substrate, such as diamond or sapphire. The performance of these devices is critically dependent on the quality of the ZnO films as well as of the interface between ZnO and the substrate. In this paper, we report the studies on piezoelectric properties of epitaxial (112~0) ZnO thin films grown on R-plane sapphire substrates using metal organic chemical vapor deposition (MOCVD) technique. The c-axis of the ZnO film is in-plane. The ZnO/R-Al/sub 2/O/sub 3/ interface is atomically sharp. SAW delay lines, aligned parallel to the c-axis, were used to characterize the surface wave velocity, coupling coefficient, and temperature coefficient of frequency as functions of film thickness to wavelength ratio (h//spl lambda/). The acoustic wave properties of the material system were calculated using Adler´s matrix method, and the devices were simulated using the quasi-static approximation based on Green´s function analysis.
Keywords
Green´s function methods; MOCVD; piezoelectric semiconductors; sapphire; semiconductor growth; surface acoustic wave devices; zinc compounds; Adler´s matrix method; Al/sub 2/O/sub 3/; Green´s function analysis; SAW devices; SAW properties; ZnO-Al/sub 2/O/sub 3/; atomically sharp; c-axis; coupling coefficient; delay lines; high acoustic velocity substrate; metal organic chemical vapor deposition; piezoelectric coupling coefficient; quasi-static approximation; surface wave velocity; temperature coefficient of frequency; Acoustic waves; Frequency; Piezoelectric devices; Piezoelectric films; Sputtering; Substrates; Surface acoustic wave devices; Surface acoustic waves; Thin film devices; Zinc oxide;
fLanguage
English
Journal_Title
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/58.949748
Filename
949748
Link To Document