• DocumentCode
    1528535
  • Title

    Importance of high local cathode spot pressure on the attachment of thermal arcs on cold cathodes

  • Author

    Coulombe, Sylvain ; Meunier, Jean-Luc

  • Author_Institution
    Dept. of Chem. Eng., McGill Univ., Montreal, Que., Canada
  • Volume
    25
  • Issue
    5
  • fYear
    1997
  • fDate
    10/1/1997 12:00:00 AM
  • Firstpage
    913
  • Lastpage
    918
  • Abstract
    The importance of having high local cathode spot pressures for the self-sustaining operation of a thermal arc plasma on a cold cathode is theoretically investigated. Applying a cathode sheath model to a Cu cathode, it is shown that cathode spot plasma pressures ranging 7.4-9.2 atm and 34.2-50 atm for electron temperatures of ~1 eV are needed to account for current densities of 109 and 1010 A·m-2, respectively. The study of the different contributions from the ions, the emission electrons, and the back-diffusing plasma electrons to the total current and heat transfer to the cathode spot has allowed us to show the following. 1) Due to the high metallic plasma densities, a strong heating of the cathode occurs and an important surface electric field is established at the cathode surface causing strong thermo-field emission of electrons. 2) Due to the presence of a high density of ions in the cathode vicinity, an important fraction of the total current is carried by the ions and the electron emission is enhanced. 3) The total current is only slightly reduced by the presence of back-diffusing plasma electrons in the cathode sheath. For a current density jtot=109 A·m-2 , the current to the cathode surface is mainly transported by the ions (76-91% of jtot while for a current density jtot = 1010 A·m-2, the thermo-field electrons become the main current carriers (61-72% of jtot). It is shown that the cathode spot plasma parameters are those of a high pressure metallic gas where deviations from the ideal gas law and important lowering of the ionization potentials are observed
  • Keywords
    arcs (electric); cathodes; copper; electron field emission; plasma density; plasma pressure; plasma sheaths; plasma temperature; 34.2 to 50 atm; 7.4 to 9.2 atm; Cu; Cu cathode; back-diffusing plasma electrons; cathode sheath model; cathode spot plasma pressure; cathode vicinity; cold cathode; cold cathodes; current density; electron temperature; emission electrons; heat transfer; high local cathode spot pressure; high metallic plasma density; high pressure metallic gas; ionization potentials; plasma parameters; self-sustaining operation; surface electric field; thermal arc plasma; thermal arcs attachment; thermo-field electron emission; Cathodes; Current density; Electron emission; Heat transfer; Plasma density; Plasma sheaths; Plasma temperature; Plasma transport processes; Resistance heating; Temperature distribution;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.649595
  • Filename
    649595