DocumentCode :
1529737
Title :
CoCrPtTa/Ti perpendicular media deposited at high sputtering rate
Author :
Lu, Bin ; Klemmer, Timothy ; Khizroev, Sakhrat ; Howard, J.Kent ; Litvinov, Dmitri ; Roy, Anup G. ; Laughlin, David E.
Author_Institution :
Seagate Technol., Pittsburgh, PA, USA
Volume :
37
Issue :
4
fYear :
2001
fDate :
7/1/2001 12:00:00 AM
Firstpage :
1319
Lastpage :
1322
Abstract :
CoCrPtTa/Ti bilayer thin films have been sputter deposited onto both glass and Al substrates under high sputtering rate in a manufacturing environment. From microstructure and magnetic property studies, it is found that Cr segregation and stacking fault density are the two major issues in obtaining high quality perpendicular media. (0002) texture orientation spread and c lattice parameter remain almost constant within the variation range of the deposition parameters, though there is a small distinction between the media on glass and those on Al substrates
Keywords :
chromium alloys; cobalt alloys; lattice constants; magnetic thin films; perpendicular magnetic recording; platinum alloys; segregation; sputtered coatings; stacking faults; tantalum alloys; titanium; Al substrate; CoCrPtTa-Ti; CoCrPtTa/Ti bilayer thin film; Cr segregation; glass substrate; lattice parameter; magnetic properties; microstructure; perpendicular recording medium; sputter deposition; stacking fault density; texture orientation; Chromium; Glass; Magnetic films; Magnetic hysteresis; Magnetic properties; Microstructure; Perpendicular magnetic recording; Sputtering; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.950829
Filename :
950829
Link To Document :
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