CoCrPtTa/Ti perpendicular media deposited at high sputtering rate

Author

Lu, Bin ; Klemmer, Timothy ; Khizroev, Sakhrat ; Howard, J.Kent ; Litvinov, Dmitri ; Roy, Anup G. ; Laughlin, David E.

Author_Institution

Seagate Technol., Pittsburgh, PA, USA

Volume

37

Issue

4

fYear

2001

fDate

7/1/2001 12:00:00 AM

Firstpage

1319

Lastpage

1322

Abstract

CoCrPtTa/Ti bilayer thin films have been sputter deposited onto both glass and Al substrates under high sputtering rate in a manufacturing environment. From microstructure and magnetic property studies, it is found that Cr segregation and stacking fault density are the two major issues in obtaining high quality perpendicular media. (0002) texture orientation spread and c lattice parameter remain almost constant within the variation range of the deposition parameters, though there is a small distinction between the media on glass and those on Al substrates

Keywords

chromium alloys; cobalt alloys; lattice constants; magnetic thin films; perpendicular magnetic recording; platinum alloys; segregation; sputtered coatings; stacking faults; tantalum alloys; titanium; Al substrate; CoCrPtTa-Ti; CoCrPtTa/Ti bilayer thin film; Cr segregation; glass substrate; lattice parameter; magnetic properties; microstructure; perpendicular recording medium; sputter deposition; stacking fault density; texture orientation; Chromium; Glass; Magnetic films; Magnetic hysteresis; Magnetic properties; Microstructure; Perpendicular magnetic recording; Sputtering; Substrates; Temperature;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.950829

Filename

950829