Title :
Improvement of magnetic and R/W properties in longitudinal media by using CrX/Cr dual underlayer
Author :
Djayaprawira, D.D. ; Horii, A. ; Komiyama, K. ; Yoshimura, S. ; Mikami, M. ; Domon, H. ; Takahashi, M.
Author_Institution :
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
fDate :
7/1/2001 12:00:00 AM
Abstract :
The effect of in-plane lattice matching on the magnetic and read/write properties has been quantitatively studied in CoCr24 Pt12B4 or CoCr20Pt8Ta 4 media grown on Cr, CrMo20 and CrMo20/Cr underlayer. It is found that by using CrMo20 (5 nm)/Cr (5 nm) dual underlayer, significant improvement of magnetic and R/W properties are realized. It is clarified that: (1) the utilization of CrMo/Cr dual underlayer increases Hc mainly due to the improvement of in-plane crystallographic orientation; (2) the lattice misfit has a small effect on the improvement of in-plane crystallographic orientation. The improvement of in-plane crystallographic orientation by using CrX/Cr dual underlayer is suggested to be due to lattice strain at the interface of Cr and CrX underlayer, which enhances the grain growth of the magnetic layer
Keywords :
X-ray diffraction; chromium alloys; cobalt alloys; ferromagnetic materials; grain growth; lattice constants; magnetic anisotropy; magnetic thin films; platinum alloys; sputter deposition; 5 nm; CoCr20Pt8Ta4; CoCr24Pt12B4; CrMo20-Cr; grain growth; in-plane crystallographic orientation; in-plane lattice matching; lattice misfit; lattice strain; longitudinal media; read/write properties; Chromium alloys; Crystallography; Design optimization; Lattices; Magnetic anisotropy; Magnetic properties; Perpendicular magnetic anisotropy; Sputtering; Substrates; X-ray scattering;
Journal_Title :
Magnetics, IEEE Transactions on
