Title :
Effects of impurities on resistivity of electrodeposited high-Bs CoNiFe-based soft magnetic thin films
Author :
Osaka, Tetsuya ; Yokoshima, Tokihiko ; Nakanishi, Takuya
Author_Institution :
Dept. of Appl. Chem., Waseda Univ., Tokyo, Japan
fDate :
7/1/2001 12:00:00 AM
Abstract :
Controlling the very small amount of inclusion of impurity elements by addition to the plating bath of various organic additives was found to be very effective in developing electrodeposited high-Bs CoNiFe soft magnetic thin films with desirably high resistivity. Included impurities were suggested to cause not only electron scattering but also decreasing grain size, both of which led to an increase of the resistivity. Chemical state of impurities was indicated to be controllable by selection of additives based on the functional group for adsorption
Keywords :
cobalt alloys; electrical resistivity; electrodeposits; ferromagnetic materials; grain size; iron alloys; magnetic impurities; magnetic thin films; magnetisation; nickel alloys; soft magnetic materials; CoNiFe; CoNiFe soft magnetic thin film; adsorption; electrical resistivity; electrodeposition; electron scattering; grain size; impurity effect; organic additive; saturation magnetization; Additives; Conductivity; Electrons; Impurities; Magnetic analysis; Magnetic films; Magnetic recording; Magnetostriction; Plasma measurements; Soft magnetic materials;
Journal_Title :
Magnetics, IEEE Transactions on
