Effect of N doping on structure and properties of DLC films produced by plasma beam deposition

Author

Yen, Bing K. ; Thiele, Jan-Ulrich ; Geisler, Michael ; Kasai, Paul H. ; White, Richard L. ; York, Brian R. ; Zadoori, Henrik ; Kellock, Andrew J. ; Tang, Wade C. ; Wu, Tsai-Wei ; Toney, Michael F. ; Marchon, Bruno

Author_Institution

IBM Almaden Res. Center, San Jose, CA, USA

Volume

37

Issue

4

fYear

2001

fDate

7/1/2001 12:00:00 AM

Firstpage

1786

Lastpage

1788

Abstract

A novel plasma beam source for the deposition of DLC films is described. Wide ranges of ion energy (130-250 eV) and C₂H₂/N₂ flow conditions have been used to investigate the effect of N doping an the structure and properties of DLC films. The resulting films are characterized by their chemical composition, Raman spectra, electron spin density, mass density, and hardness, which critically depend on the N content. The addition of N causes the sp² carbon content in the DLC films to increase and results in lower density and hardness. The film density also decreases with increasing ion energy at high N concentrations. Carbon films with maximum density and hardness of 2.1 g/cm³ and 25 GPa, respectively, can be produced using the plasma beam source

Keywords

Raman spectra; carbon; density; hardness; nitrogen; paramagnetic resonance; plasma deposited coatings; wear resistant coatings; 130 to 250 eV; C:N; DLC film; N doping; Raman spectra; chemical composition; electron spin density; hardness; mass density; plasma beam deposition; plasma beam source; protective coating; structure; Doping; Electrodes; Magnetic films; Particle beams; Plasma accelerators; Plasma applications; Plasma confinement; Plasma properties; Plasma sheaths; Plasma sources;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.950968

Filename

950968