Title :
High frequency characteristics of as-sputtered Co-Ni-Fe-N soft magnetic thin films
Author :
Kim, Y.M. ; Choi, D. ; Kim, K.H. ; Kim, J. ; Han, S.H. ; Kim, H.J.
Author_Institution :
Dept. of Phys., Myongji Univ., Yongin, South Korea
fDate :
7/1/2001 12:00:00 AM
Abstract :
Co-Ni-Fe-N soft magnetic thin films with excellent high frequency characteristics were fabricated by a N2 reactive RF magnetron sputtering method. The nitrogen partial pressure (PN2) was varied in the range of 0~10%. As PN2 increases in this range, the saturation magnetization (Bs) linearly decreases from 19.8 kG to 14 kG and the electrical resistivity (ρ) increased from 27 μΩcm to 155 μΩcm. The coercivity (Hc) exhibits the minimum value at 4% PN2. The magnetic anisotropy field (Hk) is in the range of 20~40 Oe. The high frequency characteristics of (Co22.2Ni27.6Fe50.2) 100-xNx films are excellent in the range of 3~5% P N2. Especially, the effective permeability of the film fabricated at 4% PN2 is about 800, which is maintained up to 600 MHz. This film exhibits Bs of 17.5 kG, Hc of 1.4 Oe, ρ of 98 μΩcm, and Hk of about 25 Oe. The corrosion resistance of (Co22.2Ni27.6Fe50.2 )100-xNx is improved with the increase of N concentration
Keywords :
cobalt alloys; coercive force; corrosion resistance; electrical resistivity; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic permeability; magnetic thin films; nickel alloys; nitrogen; soft magnetic materials; sputtered coatings; (Co22.2Ni27.6Fe50.2)100-x Nx films; 14 to 19.8 kG; 27 to 155 muohmcm; 600 MHz; Co-Ni-Fe-N; Co-Ni-Fe-N soft magnetic thin films; HF characteristics; N concentration; N2; N2 reactive RF magnetron sputtering; as-sputtered magnetic films; coercivity; corrosion resistance; effective permeability; electrical resistivity; high frequency characteristics; magnetic anisotropy field; saturation magnetization; Electric resistance; Iron; Magnetic anisotropy; Magnetic films; Nitrogen; Perpendicular magnetic anisotropy; Radio frequency; Saturation magnetization; Soft magnetic materials; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on