Title :
New growth method of solid phase epitaxy in sputtered YIG films
Author :
Jang, Pyung Woo ; Kim, Ji Young
Author_Institution :
Dept. of Phys., Chongju Univ., Cheongju, South Korea
fDate :
7/1/2001 12:00:00 AM
Abstract :
A new method of growing YIG films by solid phase epitaxy was attempted, for which amorphous Y-Fe-O films were sputtered on GGG (111) substrates at room temperature with a high sputtering rate, and subsequently annealed in various atmosphere at a temperature higher than 650°C. A possibility for SPE in YIG film could be verified by a constant growth rate of YIG films during the annealing as well as by results of both θ-2θ scanning and a very low value of Δθ50 in rocking curves
Keywords :
X-ray diffraction; annealing; garnets; magnetic epitaxial layers; solid phase epitaxial growth; sputtered coatings; yttrium compounds; 650 C; GGG(111) substrate; X-ray diffraction; Y-Fe-O amorphous film; YFe5O12; YIG; YIG sputtered film; annealing; growth method; solid phase epitaxy; Amorphous materials; Annealing; Epitaxial growth; Iron; Magnetic films; Optical films; Solids; Sputtering; Substrates; Temperature;
Journal_Title :
Magnetics, IEEE Transactions on
