Title :
A Test Circuit for Statistical Evaluation of
Junction Leakage Current and its Noise
Author :
Abe, Kenichi ; Fujisawa, Takafumi ; Suzuki, Hiroyoshi ; Watabe, Shunichi ; Kuroda, Rihito ; Sugawa, Shigetoshi ; Teramoto, Akinobu ; Ohmi, Tadahiro
Author_Institution :
Toshiba Corp., Yokohama, Japan
Abstract :
We develop a test circuit to evaluate statistical distributions of p-n junction leakage currents for numerous samples in a very short time (0.1-10 fA, 28672 n+-p diodes in 0.77s). This test circuit is based on a complementary metal-oxide-semiconductor active pixel image sensor, which contains a current-to-voltage conversion function by a capacitor and amplifiers of voltage signals in each pixel. The test structure can be easily designed because of a small number of mask layer requirements (at least one poly-Si, one metal interconnect layer). Its simplicity has considerable benefits, such as an easy fabrication for the evaluation of various processes technologies without exceptional cares. We demonstrate that two normal distributions exist in the steady-state (time averaging) Ileak distributions, which have differing temperature dependencies. A distribution of the activation energy extracted from temperature dependence of Ileak is also revealed experimentally. Dynamic fluctuation of Ileak is confirmed to be measured, due to the execute pseudoparallel sampling among whole samples over a long recording time.
Keywords :
CMOS image sensors; integrated circuit testing; leakage currents; p-n junctions; amplifiers; capacitor; complementary metal-oxide-semiconductor active pixel image sensor; current 0.1 fA to 10 fA; current-to-voltage conversion function; metal interconnect layer; p-n junction leakage current; statistical distributions; statistical evaluation; test circuit; time 0.77 s; Current measurement; Leakage current; Logic gates; P-n junctions; Transistors; Voltage measurement; $p-n$ junction; Leakage current; metal-oxide-semiconductor field-effect transistors (MOSFETs); statistical evaluation; test circuit; variable junction leakage;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2012.2202751