DocumentCode :
1532611
Title :
Modeling the effect of etch holes on ferromagnetic MEMS
Author :
Fang, Xianwen ; Myung, Nosang ; Nobe, Ken ; Judy, Jack W.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
Volume :
37
Issue :
4
fYear :
2001
fDate :
7/1/2001 12:00:00 AM
Firstpage :
2637
Lastpage :
2639
Abstract :
Ferromagnetic MEMS typically require etch holes to reduce the time required to release the micromechanical structure during the sacrificial-layer etch. However, the size and density of the etch holes strongly alters the coercivity of such perforated ferromagnetic films. In this study, varying the etch hole size from 100 μm squares to 5 μm squares and the etch hole spacing from 100 μm to 5 μm can nearly double the coercivity of electroplated Co-Ni-P films. A model for the dependence of coercivity on etch-hole size and density is presented that separates the contributions of surface and bulk pinning density and compares well with experimental results. In addition, the ratio of surface to bulk pinning density can be quantified with this experimental procedure and for our Co-Ni-P films is approximately equal to 2
Keywords :
cobalt alloys; coercive force; electroplated coatings; etching; ferromagnetic materials; magnetic domains; magnetic thin films; micromachining; micromechanical devices; nickel alloys; phosphorus alloys; Co-Ni-P; Co-Ni-P electroplated film; bulk pinning density; coercivity; etch hole; ferromagnetic MEMS; magnetic domains; micromachining; micromagnetics; micromechanical structure; perforation; sacrificial layer etching; surface pinning density; Coercive force; Etching; Geometry; Magnetic domain walls; Magnetic domains; Magnetic films; Magnetic materials; Magnetization; Micromachining; Micromechanical devices;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.951259
Filename :
951259
Link To Document :
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