DocumentCode :
1532643
Title :
Disturb-Free Writing Operation for Ferroelectric-Gate Field-Effect Transistor Memories With Intermediate Electrodes
Author :
Horita, Susumu ; Trinh, Bui Nguyen Quoc
Author_Institution :
Grad. Sch. of Mater. Sci., Japan Adv. Inst. of Sci. & Technol., Nomi, Japan
Volume :
56
Issue :
12
fYear :
2009
Firstpage :
3090
Lastpage :
3096
Abstract :
To achieve disturb-free writing, we proposed a new writing operation for ferroelectric-gate field-effect transistor memories with intermediate electrodes. The writing voltages VW applied to the wordlines for Pr+ and Pr0 memory states are the same pulse magnitudes, which consist of VW + followed by VW -, whereas the bias timings of the bitline voltages differ from each other. The bitline voltage for the Pr+ memory state is set high when VW is set VW +, and it is set to low by the time when VW is changed to VW -. On the other hand, the bitline voltage for the Pr0 memory state is set high until the whole writing pulse of (VW + + VW -) is finished. This is verified experimentally using a discrete circuit, which showed that the new writing operation achieves disturb-free writing. The memory consists of two transistors for data writing and reading. With the obtained experimental results, we discuss the possibilities of high integration of this memory as well as low reading voltage.
Keywords :
electrodes; ferroelectric storage; field effect transistors; discrete circuit; disturb-free writing operation; ferroelectric-gate field-effect transistor memory; intermediate electrode; Circuits; Electrodes; FETs; Ferroelectric films; Ferroelectric materials; Nonvolatile memory; Random access memory; Read-write memory; Voltage; Writing; Disturb free; ferroelectric memory; ferroelectric-gate memory; nondestructive readout; write disturbance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2009.2032744
Filename :
5306147
Link To Document :
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