DocumentCode :
1533093
Title :
Mechanisms for formation of inorganic byproducts in plasma chemical processing of hazardous air pollutants
Author :
Futamura, Shigeru ; Zhang, Aihua ; Yamamoto, Toshiaki
Author_Institution :
Nat. Inst. for Resources & Environ., Ibaraki, Japan
Volume :
35
Issue :
4
fYear :
1999
Firstpage :
760
Lastpage :
766
Abstract :
Plasma chemical behavior of hazardous air pollutants (HAPs) (Cl 2C=CCl2, Cl2C=CHCl, Cl3C-CH 3, Cl2CH-CH2Cl, CH3Cl, CH 3Br and benzene), their molecular probes (CH4, CH 3-CH3, and CH2=CH2), and carbon oxides (COx) was investigated with a ferroelectric packed-bed plasma reactor to obtain information on the formation of CO x and N2O. It has been shown that the oxidation of CO to CO2 is a slow reaction in plasma, and that CO and CO 2 mainly result from different precursors. Simultaneous achievement of complete oxidative decomposition of HAPs in plasma and recovery of CO as a chemical feedstock could be favorable. The process of N2O formation is affected by HAP structures and oxygen concentration. In the decomposition of olefinic HAPs, such as Cl2 C=CCl2 and Cl2C=CHCl, high-power short-residence-time operations are effective in suppressing N2 O formation. In the cases of CH3Cl and CH3Br, low specific energy density operations could be necessary to reduce N2O concentrations. The yields and selectivities of CO, CO2 and N2O change drastically by adding only 2% of oxygen to N2, and oxygen concentration is not a good factor to control these inorganic oxides
Keywords :
air pollution control; ferroelectric devices; ferroelectric materials; organic compounds; plasma materials processing; chemical feedstock; complete oxidative decomposition; ferroelectric packed-bed plasma reactor; hazardous air pollutants; inorganic byproducts formation mechanisms; plasma chemical processing; precursors; specific energy density; Air pollution; Carbon dioxide; Chemical hazards; Chemical reactors; Ferroelectric materials; Inductors; Inorganic chemicals; Oxidation; Plasma chemistry; Probes;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.777182
Filename :
777182
Link To Document :
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