• DocumentCode
    1533093
  • Title

    Mechanisms for formation of inorganic byproducts in plasma chemical processing of hazardous air pollutants

  • Author

    Futamura, Shigeru ; Zhang, Aihua ; Yamamoto, Toshiaki

  • Author_Institution
    Nat. Inst. for Resources & Environ., Ibaraki, Japan
  • Volume
    35
  • Issue
    4
  • fYear
    1999
  • Firstpage
    760
  • Lastpage
    766
  • Abstract
    Plasma chemical behavior of hazardous air pollutants (HAPs) (Cl 2C=CCl2, Cl2C=CHCl, Cl3C-CH 3, Cl2CH-CH2Cl, CH3Cl, CH 3Br and benzene), their molecular probes (CH4, CH 3-CH3, and CH2=CH2), and carbon oxides (COx) was investigated with a ferroelectric packed-bed plasma reactor to obtain information on the formation of CO x and N2O. It has been shown that the oxidation of CO to CO2 is a slow reaction in plasma, and that CO and CO 2 mainly result from different precursors. Simultaneous achievement of complete oxidative decomposition of HAPs in plasma and recovery of CO as a chemical feedstock could be favorable. The process of N2O formation is affected by HAP structures and oxygen concentration. In the decomposition of olefinic HAPs, such as Cl2 C=CCl2 and Cl2C=CHCl, high-power short-residence-time operations are effective in suppressing N2 O formation. In the cases of CH3Cl and CH3Br, low specific energy density operations could be necessary to reduce N2O concentrations. The yields and selectivities of CO, CO2 and N2O change drastically by adding only 2% of oxygen to N2, and oxygen concentration is not a good factor to control these inorganic oxides
  • Keywords
    air pollution control; ferroelectric devices; ferroelectric materials; organic compounds; plasma materials processing; chemical feedstock; complete oxidative decomposition; ferroelectric packed-bed plasma reactor; hazardous air pollutants; inorganic byproducts formation mechanisms; plasma chemical processing; precursors; specific energy density; Air pollution; Carbon dioxide; Chemical hazards; Chemical reactors; Ferroelectric materials; Inductors; Inorganic chemicals; Oxidation; Plasma chemistry; Probes;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/28.777182
  • Filename
    777182