DocumentCode
1533093
Title
Mechanisms for formation of inorganic byproducts in plasma chemical processing of hazardous air pollutants
Author
Futamura, Shigeru ; Zhang, Aihua ; Yamamoto, Toshiaki
Author_Institution
Nat. Inst. for Resources & Environ., Ibaraki, Japan
Volume
35
Issue
4
fYear
1999
Firstpage
760
Lastpage
766
Abstract
Plasma chemical behavior of hazardous air pollutants (HAPs) (Cl 2C=CCl2, Cl2C=CHCl, Cl3C-CH 3, Cl2CH-CH2Cl, CH3Cl, CH 3Br and benzene), their molecular probes (CH4, CH 3-CH3, and CH2=CH2), and carbon oxides (COx) was investigated with a ferroelectric packed-bed plasma reactor to obtain information on the formation of CO x and N2O. It has been shown that the oxidation of CO to CO2 is a slow reaction in plasma, and that CO and CO 2 mainly result from different precursors. Simultaneous achievement of complete oxidative decomposition of HAPs in plasma and recovery of CO as a chemical feedstock could be favorable. The process of N2O formation is affected by HAP structures and oxygen concentration. In the decomposition of olefinic HAPs, such as Cl2 C=CCl2 and Cl2C=CHCl, high-power short-residence-time operations are effective in suppressing N2 O formation. In the cases of CH3Cl and CH3Br, low specific energy density operations could be necessary to reduce N2O concentrations. The yields and selectivities of CO, CO2 and N2O change drastically by adding only 2% of oxygen to N2, and oxygen concentration is not a good factor to control these inorganic oxides
Keywords
air pollution control; ferroelectric devices; ferroelectric materials; organic compounds; plasma materials processing; chemical feedstock; complete oxidative decomposition; ferroelectric packed-bed plasma reactor; hazardous air pollutants; inorganic byproducts formation mechanisms; plasma chemical processing; precursors; specific energy density; Air pollution; Carbon dioxide; Chemical hazards; Chemical reactors; Ferroelectric materials; Inductors; Inorganic chemicals; Oxidation; Plasma chemistry; Probes;
fLanguage
English
Journal_Title
Industry Applications, IEEE Transactions on
Publisher
ieee
ISSN
0093-9994
Type
jour
DOI
10.1109/28.777182
Filename
777182
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