DocumentCode
1533396
Title
Tailoring Ion Energy Distributions Using Pulsed Plasmas
Author
Agarwal, Ankur ; Rauf, Shahid ; Collins, Ken
Author_Institution
Etch Products Bus. Group of Appl. Mater. Inc., Sunnyvale, CA, USA
Volume
39
Issue
11
fYear
2011
Firstpage
2520
Lastpage
2521
Abstract
The tuning of ion energy distribution functions (IEDFs) is extremely critical to enable scaling beyond the 3x nm node. Typical inductively coupled plasma reactors offer less control of the IEDFs compared to multi-frequency capacitively coupled plasma reactors. Power-modulated plasma has been used to enable the tailoring of IEDFs without changing operating conditions. Images are presented of various tailored IEDFs using pulsed plasmas.
Keywords
Monte Carlo methods; plasma chemistry; plasma devices; plasma simulation; plasma transport processes; inductively coupled plasma reactors; ion energy distribution functions; multifrequency capacitively coupled plasma reactor; operating condition; plasma chemistry Monte Carlo module; power-modulated plasma; pulsed plasma analysis; Etching; Inductors; Ions; Plasmas; Radio frequency; Time frequency analysis; Tuning; Inductively coupled plasma; ion energy and angular distribution; plasma etching; plasma modeling; pulse frequency; pulsed plasma;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2011.2154343
Filename
5783938
Link To Document