Title :
Tailoring Ion Energy Distributions Using Pulsed Plasmas
Author :
Agarwal, Ankur ; Rauf, Shahid ; Collins, Ken
Author_Institution :
Etch Products Bus. Group of Appl. Mater. Inc., Sunnyvale, CA, USA
Abstract :
The tuning of ion energy distribution functions (IEDFs) is extremely critical to enable scaling beyond the 3x nm node. Typical inductively coupled plasma reactors offer less control of the IEDFs compared to multi-frequency capacitively coupled plasma reactors. Power-modulated plasma has been used to enable the tailoring of IEDFs without changing operating conditions. Images are presented of various tailored IEDFs using pulsed plasmas.
Keywords :
Monte Carlo methods; plasma chemistry; plasma devices; plasma simulation; plasma transport processes; inductively coupled plasma reactors; ion energy distribution functions; multifrequency capacitively coupled plasma reactor; operating condition; plasma chemistry Monte Carlo module; power-modulated plasma; pulsed plasma analysis; Etching; Inductors; Ions; Plasmas; Radio frequency; Time frequency analysis; Tuning; Inductively coupled plasma; ion energy and angular distribution; plasma etching; plasma modeling; pulse frequency; pulsed plasma;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2011.2154343
