DocumentCode
1534659
Title
The Dependence of Retention Time on Gate Length in UTBOX FBRAM With Different Source/Drain Junction Engineering
Author
Nicoletti, Talitha ; Aoulaiche, Marc ; Almeida, Luciano M. ; Santos, Sara D dos ; Martino, João A. ; Veloso, Anabela ; Jurczak, Malgorzata ; Simoen, Eddy ; Claeys, Cor
Author_Institution
IMEC, Leuven, Belgium
Volume
33
Issue
7
fYear
2012
fDate
7/1/2012 12:00:00 AM
Firstpage
940
Lastpage
942
Abstract
The floating-body-RAM sense margin and retention-time dependence on the gate length is investigated in UTBOX devices using BJT programming combined with a positive back bias (so-called V th feedback). It is shown that the sense margin and the retention time can be kept constant versus the gate length by using a positive back bias. Nevertheless, below a critical L, there is no room for optimization, and the memory performances suddenly drop. The mechanism behind this degradation is attributed to GIDL current amplification by the lateral bipolar transistor with a narrow base. The gate length can be further scaled using underlap junctions.
Keywords
bipolar transistors; circuit optimisation; random-access storage; BJT programming; GIDL current amplification; UTBOX FBRAM devices; floating-body-RAM sense margin; gate length; gate-induced drain leakage; lateral bipolar transistor; positive back bias; retention time dependence; source-drain junction engineering; Degradation; Junctions; Logic gates; Programming; Random access memory; Silicon; Standards; 1T-floating-body RAM (FBRAM); Retention time; UTBOX; scalability; sense margin; underlap;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2196968
Filename
6213493
Link To Document