• DocumentCode
    1534659
  • Title

    The Dependence of Retention Time on Gate Length in UTBOX FBRAM With Different Source/Drain Junction Engineering

  • Author

    Nicoletti, Talitha ; Aoulaiche, Marc ; Almeida, Luciano M. ; Santos, Sara D dos ; Martino, João A. ; Veloso, Anabela ; Jurczak, Malgorzata ; Simoen, Eddy ; Claeys, Cor

  • Author_Institution
    IMEC, Leuven, Belgium
  • Volume
    33
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    940
  • Lastpage
    942
  • Abstract
    The floating-body-RAM sense margin and retention-time dependence on the gate length is investigated in UTBOX devices using BJT programming combined with a positive back bias (so-called V th feedback). It is shown that the sense margin and the retention time can be kept constant versus the gate length by using a positive back bias. Nevertheless, below a critical L, there is no room for optimization, and the memory performances suddenly drop. The mechanism behind this degradation is attributed to GIDL current amplification by the lateral bipolar transistor with a narrow base. The gate length can be further scaled using underlap junctions.
  • Keywords
    bipolar transistors; circuit optimisation; random-access storage; BJT programming; GIDL current amplification; UTBOX FBRAM devices; floating-body-RAM sense margin; gate length; gate-induced drain leakage; lateral bipolar transistor; positive back bias; retention time dependence; source-drain junction engineering; Degradation; Junctions; Logic gates; Programming; Random access memory; Silicon; Standards; 1T-floating-body RAM (FBRAM); Retention time; UTBOX; scalability; sense margin; underlap;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2196968
  • Filename
    6213493