DocumentCode :
1534681
Title :
InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts and f_{T} of 370 GHz
Author :
Yue, Yuanzheng ; Hu, Zongyang ; Guo, Jia ; Sensale-Rodriguez, Berardi ; Li, Guowang ; Wang, Ronghua ; Faria, Faiza ; Fang, Tian ; Song, Bo ; Gao, Xiang ; Guo, Shiping ; Kosel, Thomas ; Snider, Gregory ; Fay, Patrick ; Jena, Debdeep ; Xing, Huili
Author_Institution :
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
Volume :
33
Issue :
7
fYear :
2012
fDate :
7/1/2012 12:00:00 AM
Firstpage :
988
Lastpage :
990
Abstract :
We report 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency (fT) of 370 GHz. The HEMT without back barrier exhibits an extrinsic transconductance (gm.ext) of 650 mS/mm and an on/off current ratio of 106 owing to the incorporation of dielectric-free passivation and regrown ohmic contacts with a contact resistance of 0.16 Ω·mm. Delay analysis suggests that the high fT is a result of low gate-drain parasitics associated with the rectangular gate. Although it appears possible to reach 500-GHz fT by further reducing the gate length, it is imperative to investigate alternative structures that offer higher mobility/velocity while keeping the best possible electrostatic control in ultrascaled geometry.
Keywords :
III-V semiconductors; aluminium compounds; contact resistance; gallium compounds; high electron mobility transistors; indium compounds; ohmic contacts; wide band gap semiconductors; HEMT; InAlN-AlN-GaN-SiC; contact resistance; delay analysis; dielectric-free passivation; electrostatic control; extrinsic transconductance; frequency 370 GHz; gate length reduction; high-electron-mobility transistors; low gate-drain parasitics; rectangular gate; regrown ohmic contacts; size 30 nm; ultrascaled geometry; Delay; Gallium nitride; HEMTs; Logic gates; MODFETs; Ohmic contacts; $f_{T}$; AlN; GaN; InAlN; cutoff frequency; high-electron-mobility transistor (HEMT); molecular beam epitaxy (MBE); regrown ohmic contacts; transistor;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2196751
Filename :
6213496
Link To Document :
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