Title :
Low flicker-noise GaN/AlGaN heterostructure field-effect transistors for microwave communications
Author :
Balandin, A. ; Morozov, S.V. ; Cai, S. ; Li, R. ; Wang, K.L. ; Wijeratne, G. ; Viswanathan, C.R.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
fDate :
8/1/1999 12:00:00 AM
Abstract :
We report a detailed investigation of flicker noise in novel GaN/AlGaN heterostructure field-effect transistors (GaN HFET). Low values of 1/f noise found in these devices (i.e., the Hooge parameter is on the order of 10-1) open up the possibility for applications in communication systems. We have examined the scaling of the noise spectral density with the device dimensions in order to optimize their performance. It was also found that the slope γ of the 1/fγ noise density spectrum is in the 1.0-1.3 range for all devices and decreases with the decreasing (i.e., more negative) gate bias. The results are important for low-noise electronic technologies requiring a low phase-noise level
Keywords :
1/f noise; III-V semiconductors; aluminium compounds; flicker noise; gallium compounds; microwave field effect transistors; phase noise; semiconductor device noise; 1/f noise; GaN-AlGaN; Hooge parameter; flicker noise; gate bias; heterostructure field-effect transistors; low-noise electronic technologies; microwave communications; noise density spectrum; noise spectral density; phase-noise level; scaling; 1f noise; Aluminum gallium nitride; FETs; Gallium nitride; HEMTs; MODFETs; Microwave communication; Microwave devices; Microwave technology; Semiconductor device noise;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on