DocumentCode
1535492
Title
An Investigation of Electrothermal Characteristics on Low-Temperature Polycrystalline-Silicon Thin-Film Transistors
Author
Tai, Ya-Li ; Lee, Jam-Wem ; Lien, Chen-Hsin
Author_Institution
Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume
10
Issue
1
fYear
2010
fDate
3/1/2010 12:00:00 AM
Firstpage
96
Lastpage
99
Abstract
In this paper, theoretical and experimental analyses have been performed to explore the electrothermal characteristics in low-temperature polycrystalline-silicon thin-film transistors (LTPS TFTs). A theoretical simulation reveals that electrothermal effects strongly influence the performance of LTPS TFTs, particularly under high-current conditions. Measurements show that, under extremely high currents, LTPS devices demonstrate an open-circuit behavior, while the behavior of devices based on single-crystalline silicon films using an SOI CMOS process results in a short-circuit model. In summary, both the simulation and measurements indicate that grain boundaries will degrade the electrothermal properties of the LTPS thin film and suppress reliability in TFT design.
Keywords
MOSFET; elemental semiconductors; grain boundaries; semiconductor device models; semiconductor thin films; silicon; silicon-on-insulator; thermoelectricity; thin film transistors; SOI CMOS process; Si-SiO2; TFT design; electrothermal properties; grain boundary degradation; high current conditions; low-temperature polycrystalline-silicon thin-film transistors; open-circuit behavior; short-circuit model; silicon-on-insulator complementary metal-oxide semiconductor; Electrostatic discharge (ESD); electrothermal effects; grain boundaries; low-temperature polycrystalline-silicon thin-film transistor (LTPS TFT);
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2009.2035105
Filename
5308290
Link To Document