DocumentCode :
1535492
Title :
An Investigation of Electrothermal Characteristics on Low-Temperature Polycrystalline-Silicon Thin-Film Transistors
Author :
Tai, Ya-Li ; Lee, Jam-Wem ; Lien, Chen-Hsin
Author_Institution :
Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume :
10
Issue :
1
fYear :
2010
fDate :
3/1/2010 12:00:00 AM
Firstpage :
96
Lastpage :
99
Abstract :
In this paper, theoretical and experimental analyses have been performed to explore the electrothermal characteristics in low-temperature polycrystalline-silicon thin-film transistors (LTPS TFTs). A theoretical simulation reveals that electrothermal effects strongly influence the performance of LTPS TFTs, particularly under high-current conditions. Measurements show that, under extremely high currents, LTPS devices demonstrate an open-circuit behavior, while the behavior of devices based on single-crystalline silicon films using an SOI CMOS process results in a short-circuit model. In summary, both the simulation and measurements indicate that grain boundaries will degrade the electrothermal properties of the LTPS thin film and suppress reliability in TFT design.
Keywords :
MOSFET; elemental semiconductors; grain boundaries; semiconductor device models; semiconductor thin films; silicon; silicon-on-insulator; thermoelectricity; thin film transistors; SOI CMOS process; Si-SiO2; TFT design; electrothermal properties; grain boundary degradation; high current conditions; low-temperature polycrystalline-silicon thin-film transistors; open-circuit behavior; short-circuit model; silicon-on-insulator complementary metal-oxide semiconductor; Electrostatic discharge (ESD); electrothermal effects; grain boundaries; low-temperature polycrystalline-silicon thin-film transistor (LTPS TFT);
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2009.2035105
Filename :
5308290
Link To Document :
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