• DocumentCode
    1536616
  • Title

    AlGaN/AlGaN double-heterojunction ultraviolet light-emitting diodes grown by metal organic chemical vapour deposition

  • Author

    Wong, M.M. ; Denyszyn, J.C. ; Collins, C.J. ; Chowdhury, U. ; Zhu, T.G. ; Kim, K.S. ; Depuis, R.D.

  • Author_Institution
    Microelectron. Res. Center, Texas Univ., Austin, TX, USA
  • Volume
    37
  • Issue
    19
  • fYear
    2001
  • fDate
    9/13/2001 12:00:00 AM
  • Firstpage
    1188
  • Lastpage
    1190
  • Abstract
    Light emitting diodes using an AlxGa1-yNiAl yGa1-yN double-heterojunction have been demonstrated with an ultraviolet emission peak at λ=321 nm with a linewidth of 7.7 nm. The devices were grown by metal organic chemical vapour deposition on c-plane sapphire substrates. The active region is composed of a single layer of AlxGa1-xN (x=0.23) and the cladding layers are p-type and n-type AlyGa1-y N (y=0.45). The light output from the diodes was measured through the sapphire substrate in a `p-side down´ configuration. At a current of 35 mA DC, an output power of ~39 nW was measured without any coatings on the device
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; gallium compounds; light emitting diodes; wide band gap semiconductors; 321 nm; 35 mA; 39 nW; Al2O3; AlxGa1-xN; AlGaN; AlGaN/AlGaN double-heterojunction ultraviolet light-emitting diodes; DC current; active region; c-plane sapphire substrates; cladding layers; light output; linewidth; metal organic chemical vapour deposition; output power; side down configuration; ultraviolet emission peak;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20010779
  • Filename
    953340