• DocumentCode
    1536696
  • Title

    Microtechnology and microsystems in measurement applications

  • Author

    Wolffenbuffel, R.F. ; Van Mullem, Cees J.

  • Author_Institution
    Lab. of Eletron. Instrum., Delft Univ. of Technol., Netherlands
  • Volume
    4
  • Issue
    3
  • fYear
    2001
  • fDate
    9/1/2001 12:00:00 AM
  • Firstpage
    21
  • Lastpage
    23
  • Abstract
    Microtechnology has made inroads into metrology. MEMS structures in thermal RMS-to-DC conversion are at a mature stage. Many more applications are in their infancy and require more basic and applied research. Next to metrology, these may open doors to the higher performance instruments. A characteristic of MEMS is the reproducibility of the structure, which is important in metrology. Standard microelectronic processing and low-cost batch fabrication, which are often the main driving force in other applications areas, are less important in metrology because of the modest production volumes. Compatibility becomes an important issue when one tries to implement a reference element in a microsystem
  • Keywords
    calibration; electrostatic actuators; micromachining; micromechanical devices; transfer standards; voltage measurement; DC standard; MEMS structures; calibration; compatibility; high performance instruments; measurement applications; micromachining; microsystems; microtechnology; pull-in voltage; reproducibility; stability; thermal RMS-to-DC conversion; transfer standards; Biomembranes; Electrostatics; Integrated circuit measurements; Micromachining; Residual stresses; Resistors; Temperature measurement; Thermal force; Thermal resistance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Instrumentation & Measurement Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    1094-6969
  • Type

    jour

  • DOI
    10.1109/5289.953454
  • Filename
    953454