Title :
Opportunities for microtechnology in metrology
Author :
Wijngaards, Davey ; Wolffenbuttel, Reinoud F.
Author_Institution :
Instrum. Lab., Delft Univ. of Technol., Netherlands
fDate :
9/1/2001 12:00:00 AM
Abstract :
The vast infrastructure of the microelectronic and microtechnological processing industry has yielded highly reproducible devices through reliable, reproducible, and fabrication-compatible processing techniques. Much development has occurred in bulk and surface micromachining, as well as in thin-film deposition techniques. Nevertheless, only a limited number of metrological applications have benefited from the use of this technology. Only two metrological applications that use microtechnology have been developed into commercially available devices: the JJA, as a DC reference, and the thermal RMS-to-DC converter, as an AC reference. Single electron tunneling devices and micromachined electrostatic RMS-to-DC converters are still under development. The accuracy requirements of the existing applications will continue to increase. This makes the development of on-chip references and on-chip self-test and self-calibration facilities essential. These microelectronic features, until now have remained unexploited in metrology, as well as in most other applications
Keywords :
calibration; electrostatic actuators; micromachining; micromechanical devices; transfer standards; voltage measurement; AC reference; DC reference; Josephson junction array; MEMS; accuracy requirements; bulk micromachining; electrostatic RMS-to-DC converter; fabrication-compatible processing; metrology; microtechnology; on-chip references; on-chip self-test; reproducible devices; self-calibration; surface micromachining; thermal RMS-to-DC converter; Analog-digital conversion; Built-in self-test; Electrons; Electrostatics; Metrology; Microelectronics; Micromachining; Sputtering; Textile industry; Tunneling;
Journal_Title :
Instrumentation & Measurement Magazine, IEEE
DOI :
10.1109/5289.953455