• DocumentCode
    1537119
  • Title

    Superluminescent diodes with angled facet etched by chemically assisted ion beam etching

  • Author

    Lin, Chih-Fan

  • Author_Institution
    Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
  • Volume
    27
  • Issue
    11
  • fYear
    1991
  • fDate
    5/23/1991 12:00:00 AM
  • Firstpage
    968
  • Lastpage
    970
  • Abstract
    A superluminescent diode with very low spectral modulation has been made with one cleaved facet and one angled facet etched by chemically assisted ion beam etching. Without antireflection coating, the reflection of light back into the waveguide from the etched angled facet is less than 1*10-5. In addition, 85% of the total output power can be coupled from the etched angled facet without applying any antireflection or high-reflection coating on either facet.
  • Keywords
    light emitting diodes; sputter etching; superradiance; LED; chemically assisted ion beam etching; cleaved facet; etched angled facet; low spectral modulation; superluminescent diode;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19910604
  • Filename
    78119