DocumentCode
1537359
Title
Avalanche multiplication characteristics of Al0.8Ga0.2As diodes
Author
Ng, B.K. ; David, J.P.R. ; Plimmer, S.A. ; Rees, G.J. ; Tozer, R.C. ; Hopkinson, M. ; Hill, G.
Author_Institution
Dept. of Electron. & Electr. Eng., Sheffield Univ., UK
Volume
48
Issue
10
fYear
2001
fDate
10/1/2001 12:00:00 AM
Firstpage
2198
Lastpage
2204
Abstract
The avalanche multiplication characteristics of Al0.8Ga 0.2As have been investigated in a series of p-i-n and n-i-p diodes with i-region widths, w, varying from 1 μm to 0.025 μm. The electron ionization coefficient, α, is found to be consistently higher than the hole ionization coefficient, β, over the entire range of electric fields investigated. By contrast with AlxGa 1-xAs (x⩽0.6) a significant difference between the electron and hole initiated multiplication characteristics of very thin Al0.8Ga0.2As diodes (w=0.025 μm) was observed. Dead space effects in the diodes with w⩽0.1 μm were found to reduce the multiplication at low bias below the values predicted from bulk ionization coefficients. Effective α and β that are independent of w have been deduced from measurements and are able to reproduce accurately the multiplication characteristics of diodes with w⩾0.1 μm and breakdown voltages of all diodes with good accuracy. By performing a simple correction for the dead space, the multiplication characteristics of even thinner diodes were also predicted with reasonable accuracy
Keywords
III-V semiconductors; aluminium compounds; avalanche photodiodes; gallium arsenide; p-i-n photodiodes; 0.025 to 1 micron; APDs; Al0.8Ga0.2As; III-V semiconductors; avalanche multiplication characteristics; breakdown voltages; bulk ionization coefficients; dead space effects; electron ionization coefficient; hole ionization coefficient; i-region widths; multiplication characteristics; n-i-p diodes; p-i-n diodes; Accuracy; Charge carrier processes; Gallium arsenide; Heterojunctions; Impact ionization; P-i-n diodes; PIN photodiodes; Semiconductor devices; Semiconductor diodes; Space technology;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.954454
Filename
954454
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