DocumentCode
1537425
Title
Effect of imprint on operation and reliability of ferroelectric random access memory (FeRAM)
Author
Inoue, Naoya ; Hayashi, Yoshihiro
Author_Institution
Silicon Syst. Res. Labs., NEC Corp., Kanagawa, Japan
Volume
48
Issue
10
fYear
2001
fDate
10/1/2001 12:00:00 AM
Firstpage
2266
Lastpage
2272
Abstract
The effect of the imprint on the operation of the ferroelectric random access memory (FeRAM) was estimated by a quasitheoretical model, including the hysteresis shift along the voltage axis and the depolarization induced by the hysteresis shift. Based on the experimental data of the imprint up to 90 days, the hysteresis shift and the depolarization are expressed by a stretched exponential equation as the aging time, and a hyperbolic tangent as the shifted voltage, respectively. Using this model, nonlinear phenomena of bit-line voltage change with the aging time is successfully predicted, and the aging reliability for two transistor and two capacitor (2T/2C) cell architecture with the imprinted capacitors is estimated for the first time. This technique is applied to the evaluation of aging reliability for the Pb(Zr,Ti)O3 and (Pb,La)(Zr,Ti)O3 capacitors, revealing that the latter has higher reliability than the former
Keywords
ageing; dielectric depolarisation; dielectric hysteresis; ferroelectric storage; random-access storage; reliability; 2T/2C cell; PLZT; PLZT capacitor; PZT; PZT capacitor; PbLaZrO3TiO3; PbZrO3TiO3; aging reliability; bit-line voltage; depolarization; ferroelectric random access memory; hyperbolic tangent; hysteresis shift; imprint effect; stretched exponential equation; Aging; Capacitors; Ferroelectric films; Ferroelectric materials; Hysteresis; Nonlinear equations; Nonvolatile memory; Predictive models; Random access memory; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.954465
Filename
954465
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