DocumentCode :
1538503
Title :
Experimental analysis of the electrode products emitted by high-current vacuum arcs
Author :
Kutzner, Janusz ; Batura, R. ; Stachowiak, Z.
Author_Institution :
Inst. of Electr. Power Eng., Poznan Tech. Univ., Poland
Volume :
27
Issue :
4
fYear :
1999
fDate :
8/1/1999 12:00:00 AM
Firstpage :
888
Lastpage :
893
Abstract :
The mass distribution of particles produced in the high-current vacuum arc was investigated. The experiments were concentrated on evaluating the spatial mass distribution emitted in the radial as well as in the azimuthal directions calculated from the mass deposition profile on collectors surrounding the arc discharge. The experiments were carried out in a vacuum chamber evacuated to an ambient pressure <10-4 Pa. High-current arcs in the range from 2-7.5 kA were drawn between butt contacts of 31 and 55 mm in diameter (anode and cathode, respectively) both of a copper-chromium alloy (CuCr25). The surface mass deposited along multi-segment collectors was measured by a micro densitometer, and an inductively coupled plasma (ICP) spectrometer. Two angular mass deposit distributions were determined: the azimuthal distribution on the plane parallel to the cathode surface, and the radial distribution as a function of the angle with respect to the cathode plane. Both distributions were anisotropic and the structure of the deposition layer depended on the angle of incidence of the particles onto the substrate, the density of the particle flux and other factors. The mass deposited on the collectors consisted mostly of chromium molecules (approx. 80% of Cr and 20% Cu) for CuCr25 or CuCr40 electrodes
Keywords :
electrodes; plasma density; plasma diagnostics; plasma materials processing; plasma pressure; plasma-wall interactions; vacuum arcs; 2 to 7.5 kA; Cu-Cr; CuCr25 electrodes; CuCr40 electrodes; ambient pressure; angular mass deposit distributions; arc discharge; azimuthal direction; azimuthal distribution; butt contacts; cathode plane; cathode surface; copper-chromium alloy; deposition layer; electrode products; high-current arcs; high-current vacuum arcs; inductively coupled plasma spectrometer; mass distribution; micro densitometer; multi-segment collectors; particle flux; particle production; radial direction; radial distribution; spatial mass distribution; surface mass deposition; vacuum chamber; Anodes; Arc discharges; Cathodes; Chromium; Copper alloys; Density measurement; Electrodes; Plasma density; Plasma measurements; Vacuum arcs;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.782255
Filename :
782255
Link To Document :
بازگشت