Title :
Vacuum-arc-generated macroparticles in the nanometer range
Author :
Monteiro, Othon R. ; Anders, André
Author_Institution :
Lawrence Berkeley Nat. Lab., California Univ., CA, USA
fDate :
8/1/1999 12:00:00 AM
Abstract :
Micron and submicron “macroparticles” are produced along with the plasma at vacuum arc cathode spots. Published data refer to the size range 0.2-100 μm. The lower limit is determined by the resolution of the equipment used (usually scanning electron microscopes). In the present study we focus on the detection and characterization of nanosize macroparticles (“nanoparticles”) using atomic force microscopy and fieid-emission scanning electron microscopy. New information is gathered on material-dependent size distribution functions as well as on the effectiveness of magnetic filtering for nanoparticles
Keywords :
atomic force microscopy; field emission electron microscopy; nanostructured materials; nanotechnology; plasma applications; scanning electron microscopy; vacuum arcs; 0.2 to 100 mum; atomic force microscopy; fieid-emission scanning electron microscopy; magnetic filtering effectiveness; material-dependent size distribution functions; micron-sized macroparticles; nanometer range; nanoparticles; nanosize macroparticles; particle size range; scanning electron microscopes; submicron-sized macroparticles; vacuum arc cathode spots; vacuum-arc-generated macroparticles; Atomic force microscopy; Cathodes; Distribution functions; Information filtering; Information filters; Magnetic separation; Nanoparticles; Plasmas; Scanning electron microscopy; Vacuum arcs;
Journal_Title :
Plasma Science, IEEE Transactions on
