DocumentCode
1538645
Title
N2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum
Author
Takikawa, Hirofumi ; Kawakami, Naoya ; Sakakibara, Tateki
Author_Institution
Toyohashi Univ. of Technol., Japan
Volume
27
Issue
4
fYear
1999
fDate
8/1/1999 12:00:00 AM
Firstpage
1034
Lastpage
1038
Abstract
Al evaporation and N2 absorption rates during cathodic arc evaporation with an Al cathode and N2 gas flow were measured as a function of process pressure under medium pressure. These rates decreased as the pressure increased. The ratio of the Al evaporation rate to the N2 absorption rate was about 2:1. The film deposited on the anode chamber was analyzed by an X-ray diffraction analyzer and found to be aluminum nitride (AlN). This result indicates that N2 gas is mostly absorbed and fixed in the deposits on the anode surface in the form of AlN
Keywords
absorption; cathodes; evaporation; nitrogen; plasma CVD; vacuum arcs; -1 to 10 min; 0.1 to 10 Pa; Al; Al cathode; Al evaporation rate; AlN; AlN film; N2; N2 absorption rate; N2 absorption rates; N2 gas; N2 gas absorption; N2 gas flow; X-ray diffraction analysis; anode chamber; anode surface; cathodic arc evaporation; cathodic vacuum arc apparatus; deposits; film deposition; medium pressure; medium vacuum; pressure dependence; process pressure; scanning electron micrography; Anodes; Cathodes; Electromagnetic wave absorption; Fluid flow; Magnetic films; Optical films; Piezoelectric films; Scanning electron microscopy; Semiconductor films; Vacuum arcs;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.782277
Filename
782277
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