• DocumentCode
    1539181
  • Title

    AlGaAs/GaAs surface emitting laser diode with curved reflector

  • Author

    Lee, Seung-Chul

  • Volume
    26
  • Issue
    18
  • fYear
    1990
  • Firstpage
    1506
  • Lastpage
    1508
  • Abstract
    An AlGaAs/GaAs surface-emitting laser diode using one step liquid phase epitaxial growth has been successfully fabricated. A micro-cleavage technique was developed to fabricate the mirrors of the laser cavity. The laser beam emitted horizontally from the edge of the laser cavity is converted to the vertical direction using a nearby slant metal reflector formed by pregrowth selective etching of the substrate and subsequent liquid phase epitaxial growth. The maximum power output is beyond 10 mW and the threshold current density achieved is 8 kA/cm2. The full width at half maximum of the far field pattern perpendicular to the laser bar is 9 degrees .
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; liquid phase epitaxial growth; semiconductor junction lasers; semiconductor technology; 10 mW; AlGaAs-GaAs; III-V semiconductors; laser cavity; micro-cleavage; mirrors; one step liquid phase epitaxial growth; pregrowth selective etching; semiconductor laser; slant metal reflector; surface emitting laser diode; threshold current density; vertical direction;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19900967
  • Filename
    58121