DocumentCode
1539181
Title
AlGaAs/GaAs surface emitting laser diode with curved reflector
Author
Lee, Seung-Chul
Volume
26
Issue
18
fYear
1990
Firstpage
1506
Lastpage
1508
Abstract
An AlGaAs/GaAs surface-emitting laser diode using one step liquid phase epitaxial growth has been successfully fabricated. A micro-cleavage technique was developed to fabricate the mirrors of the laser cavity. The laser beam emitted horizontally from the edge of the laser cavity is converted to the vertical direction using a nearby slant metal reflector formed by pregrowth selective etching of the substrate and subsequent liquid phase epitaxial growth. The maximum power output is beyond 10 mW and the threshold current density achieved is 8 kA/cm2. The full width at half maximum of the far field pattern perpendicular to the laser bar is 9 degrees .
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; liquid phase epitaxial growth; semiconductor junction lasers; semiconductor technology; 10 mW; AlGaAs-GaAs; III-V semiconductors; laser cavity; micro-cleavage; mirrors; one step liquid phase epitaxial growth; pregrowth selective etching; semiconductor laser; slant metal reflector; surface emitting laser diode; threshold current density; vertical direction;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19900967
Filename
58121
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