DocumentCode :
1539402
Title :
Electronic cooling in Nb/AlO/sub x//Al/AlO/sub x//Nb double tunnel junctions
Author :
Capogna, L. ; Burnell, G. ; Blamire, M.G.
Author_Institution :
Dipartimento di Fisica, Salerno Univ., Italy
Volume :
7
Issue :
2
fYear :
1997
fDate :
6/1/1997 12:00:00 AM
Firstpage :
2415
Lastpage :
2418
Abstract :
Several recent papers have predicted the feasibility of superconducting tunnel junction-based electronic cryocooler devices operating in the temperature range 0.1-4 K. We have extended previous work in stacked Nb/AlO/sub x/ devices to investigate the nonequilibrium effects in them and to examine the influence of barrier conductance and layer thickness on the electronic cooling achievable by this technique. We have also analysed the maximum cooling possible with junctions of our present conductance.
Keywords :
aluminium; aluminium compounds; cooling; niobium; superconducting devices; superconducting junction devices; superconductive tunnelling; 0.1 to 4 K; Nb-AlO-Al-AlO-Nb; Nb/AlO/sub x//Al/AlO/sub x//Nb double tunnel junction; SINIS junction; barrier conductance; electronic cooling; layer thicknes; nonequilibrium effects; stacked superconducting cryocooler device; Artificial intelligence; Electrodes; Electronics cooling; Josephson junctions; Niobium; Physics; Superconducting epitaxial layers; Temperature distribution; Vacuum systems; Voltage;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.621727
Filename :
621727
Link To Document :
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