DocumentCode :
1541674
Title :
Properties of SNS Josephson junctions fabricated by 200 keV oxygen implantation into YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta//
Author :
Kahlmann, F. ; Engelhardt, A. ; Schubert, J. ; Zander, W. ; Buchal, C. ; Hollkott, J.
Author_Institution :
Inst. fur Schicht- und Ionentech., Forschungszentrum Julich GmbH, Germany
Volume :
9
Issue :
2
fYear :
1999
fDate :
6/1/1999 12:00:00 AM
Firstpage :
2874
Lastpage :
2877
Abstract :
The properties of SNS Josephson junctions in YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// thin films have been investigated, which were fabricated by oxygen irradiation at 200 keV through a 50 nm wide slit in an implantation mask. After annealing the irradiated microbridges at 500/spl deg/C in an oxygen atmosphere, the implanted region has a reduced but finite transition temperature, allowing Josephson coupling in a temperature window of <15 K. Close to the coupling temperature the critical current shows a nearly complete modulation in an applied magnetic field. This indicates a homogeneous current distribution in the junctions and therefore a homogeneous defect distribution throughout the implanted and subsequently annealed region of the superconducting microbridges. Over the entire temperature range of Josephson coupling, the junctions exhibit resistively shunted junction like I-V characteristics with additional excess current. Furthermore, the exponential dependence of the critical current on temperature is in good agreement with conventional superconductor-normal-superconductor proximity effect theory.
Keywords :
Josephson effect; annealing; barium compounds; high-temperature superconductors; ion implantation; proximity effect (superconductivity); superconducting microbridges; superconducting thin films; superconductor-normal-superconductor devices; yttrium compounds; 200 keV; 500 C; I-V characteristics; SNS Josephson junction; YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// thin film; YBa/sub 2/Cu/sub 3/O/sub 7/; annealing; coupling temperature; critical current; current distribution; defect distribution; magnetic field; oxygen implantation; proximity effect; resistively shunted junction; superconducting microbridge; superconductor-normal-superconductor junction; transition temperature; Annealing; Atmosphere; Couplings; Critical current; Josephson junctions; Magnetic fields; Magnetic modulators; Superconducting devices; Superconducting transition temperature; Transistors;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.783629
Filename :
783629
Link To Document :
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