DocumentCode
1541793
Title
Fin-Width Dependence of BJT-Based 1T-DRAM Implemented on FinFET
Author
Moon, Dong-Il ; Choi, Sung-Jin ; Han, Jin-Woo ; Kim, Sungho ; Choi, Yang-Kyu
Author_Institution
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume
31
Issue
9
fYear
2010
Firstpage
909
Lastpage
911
Abstract
This letter investigates fin-width dependence on single-transistor latch (STL) for bipolar-junction-transistor (BJT)-based 1T-DRAM through experiments. The minimum drain voltage (Vlatch) for the activation of a parasitic lateral BJT in SOI FinFET was measured at various gate lengths (LG´s) and fin widths (Wfin´s). The multiplication factor and current gain of the parasitic BJT in SOI MOSFET are introduced as determinant factors. The experimental results clearly show that the value of Vlatch is reduced in a shorter LG and wider Wfin device. It was found that the nonlocal effect retards the reduction of Vlatch as FinFET scales down.
Keywords
DRAM chips; MOSFET; bipolar transistors; silicon-on-insulator; BJT-based 1T-DRAM; Fin-width dependence; MOSFET; SOI FinFET; bipolar-junction-transistor; parasitic lateral BJT; single-transistor latch; Capacitors; Educational programs; FinFETs; Length measurement; MOSFET circuits; Moon; Nonvolatile memory; Random access memory; Research and development; Voltage; Bipolar-junction-transistor (BJT)-based 1T-DRAM; DRAM; FinFET; SOI MOSFET; capacitorless 1T-DRAM; embedded memory; nonlocal effect; parasitic BJT; single-transistor latch (STL);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2010.2052015
Filename
5512596
Link To Document