• DocumentCode
    1541793
  • Title

    Fin-Width Dependence of BJT-Based 1T-DRAM Implemented on FinFET

  • Author

    Moon, Dong-Il ; Choi, Sung-Jin ; Han, Jin-Woo ; Kim, Sungho ; Choi, Yang-Kyu

  • Author_Institution
    Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
  • Volume
    31
  • Issue
    9
  • fYear
    2010
  • Firstpage
    909
  • Lastpage
    911
  • Abstract
    This letter investigates fin-width dependence on single-transistor latch (STL) for bipolar-junction-transistor (BJT)-based 1T-DRAM through experiments. The minimum drain voltage (Vlatch) for the activation of a parasitic lateral BJT in SOI FinFET was measured at various gate lengths (LG´s) and fin widths (Wfin´s). The multiplication factor and current gain of the parasitic BJT in SOI MOSFET are introduced as determinant factors. The experimental results clearly show that the value of Vlatch is reduced in a shorter LG and wider Wfin device. It was found that the nonlocal effect retards the reduction of Vlatch as FinFET scales down.
  • Keywords
    DRAM chips; MOSFET; bipolar transistors; silicon-on-insulator; BJT-based 1T-DRAM; Fin-width dependence; MOSFET; SOI FinFET; bipolar-junction-transistor; parasitic lateral BJT; single-transistor latch; Capacitors; Educational programs; FinFETs; Length measurement; MOSFET circuits; Moon; Nonvolatile memory; Random access memory; Research and development; Voltage; Bipolar-junction-transistor (BJT)-based 1T-DRAM; DRAM; FinFET; SOI MOSFET; capacitorless 1T-DRAM; embedded memory; nonlocal effect; parasitic BJT; single-transistor latch (STL);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2052015
  • Filename
    5512596