DocumentCode :
1541793
Title :
Fin-Width Dependence of BJT-Based 1T-DRAM Implemented on FinFET
Author :
Moon, Dong-Il ; Choi, Sung-Jin ; Han, Jin-Woo ; Kim, Sungho ; Choi, Yang-Kyu
Author_Institution :
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume :
31
Issue :
9
fYear :
2010
Firstpage :
909
Lastpage :
911
Abstract :
This letter investigates fin-width dependence on single-transistor latch (STL) for bipolar-junction-transistor (BJT)-based 1T-DRAM through experiments. The minimum drain voltage (Vlatch) for the activation of a parasitic lateral BJT in SOI FinFET was measured at various gate lengths (LG´s) and fin widths (Wfin´s). The multiplication factor and current gain of the parasitic BJT in SOI MOSFET are introduced as determinant factors. The experimental results clearly show that the value of Vlatch is reduced in a shorter LG and wider Wfin device. It was found that the nonlocal effect retards the reduction of Vlatch as FinFET scales down.
Keywords :
DRAM chips; MOSFET; bipolar transistors; silicon-on-insulator; BJT-based 1T-DRAM; Fin-width dependence; MOSFET; SOI FinFET; bipolar-junction-transistor; parasitic lateral BJT; single-transistor latch; Capacitors; Educational programs; FinFETs; Length measurement; MOSFET circuits; Moon; Nonvolatile memory; Random access memory; Research and development; Voltage; Bipolar-junction-transistor (BJT)-based 1T-DRAM; DRAM; FinFET; SOI MOSFET; capacitorless 1T-DRAM; embedded memory; nonlocal effect; parasitic BJT; single-transistor latch (STL);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2052015
Filename :
5512596
Link To Document :
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