DocumentCode
1542023
Title
Device Characterization of p/i/n Thin-Film Phototransistor for Photosensor Applications
Author
Kimura, Mutsumi ; Miura, Yuta ; Ogura, Takeshi ; Ohno, Shiro ; Hachida, Tomohisa ; Nishizaki, Yoshitaka ; Yamashita, Takehiko ; Shima, Takehiro
Author_Institution
Dept. of Electron. & Inf., Ryukoku Univ., Otsu, Japan
Volume
31
Issue
9
fYear
2010
Firstpage
984
Lastpage
986
Abstract
A promising photodevice, called p/i/n thin-film phototransistor, has been characterized from the viewpoint of operation condition and device behavior. It is found that the detected current becomes maximal when the control voltage is equal to the applied voltage. This is because a depletion layer is widely formed, and generated carriers are transported through an electron channel with high conductance instead of a hole channel. Finally, we propose a diode-connected structure as a sensitive photodevice.
Keywords
optical sensors; phototransistors; thin film transistors; diode-connected structure; electron channel; p-i-n thin-film phototransistor; photodevice; photosensor applications; Diodes; Educational institutions; Educational technology; Fabrication; Glass; Phototransistors; Plasma measurements; Substrates; Thin film devices; Thin film transistors; Device behavior; device characterization; diode-connected structure; operation condition; p/i/n thin-film phototransistor (TFPT); photosensor application;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2010.2052234
Filename
5512634
Link To Document