DocumentCode :
154213
Title :
Design of multilevel interconnect network of an ASIC macrocell for 7.5nm technology node using carbon based interconnects
Author :
Farahani, Esmat Kishani ; Sarvari, Reza
Author_Institution :
Dept. of Electr. Eng., Sharif Univ. of Technol., Tehran, Iran
fYear :
2014
fDate :
20-23 May 2014
Firstpage :
163
Lastpage :
166
Abstract :
Multilevel interconnect network of a macrocell for 7.5 nm technology node is designed with carbon based interconnects (CBI) and Cu. Results are compared. Constrains of using CBI is discussed. It is shown that by using CBI power dissipation associated with wires could decrease by 32%. To use GNRs for more than one metal pair, reverse wire pitch idea is proposed that prevents undesirable increase in the number of metal layers.
Keywords :
application specific integrated circuits; carbon; copper; integrated circuit design; integrated circuit interconnections; wires (electric); ASIC macrocell; C; CBI power dissipation; Cu; carbon based interconnects; metal layers; multilevel interconnect network; reverse wire pitch; size 7.5 nm; Computer aided software engineering; Delays; Logic gates; Macrocell networks; Metals; Power dissipation; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4799-5016-4
Type :
conf
DOI :
10.1109/IITC.2014.6831853
Filename :
6831853
Link To Document :
بازگشت