DocumentCode :
1542177
Title :
\\hbox {PbZr}_{x}\\hbox {Ti}_{1 - x}\\hbox {O}_{3} Ferroelectric Thin-Film Capacitors for Flexible Nonvolatile Memory Applications
Author :
Rho, Jonghyun ; Kim, Sang Jin ; Heo, Wook ; Lee, Nae-Eung ; Lee, Hwan-Soo ; Ahn, Jong-Hyun
Author_Institution :
Sch. of Adv. Mater. Sci. & Eng., Sungkyunkwan Univ., Suwon, South Korea
Volume :
31
Issue :
9
fYear :
2010
Firstpage :
1017
Lastpage :
1019
Abstract :
This letter reports the fabrication of PbZrxTi1-xO3 (PZT) thin-film capacitors on flexible plastic substrates. The PZT film was formed on a wafer using a sol-gel method and transferred to a thin plastic substrate using an elastomeric stamp. The PZT film on the plastic substrate showed a well-saturated hysteresis loop with a Pr of ~ 20μC/cm2 and a Vc of ~1.1 V at a supplied voltage of 3 V, which are similar to those observed for PZT films on rigid wafers, as well as stable operation under an 8-mm bending radius. These characteristics suggest promising applications in flexible electronic systems.
Keywords :
ferroelectric capacitors; ferroelectric storage; ferroelectric thin films; flexible electronics; lead compounds; sol-gel processing; thin film capacitors; PZT; PZT film; elastomeric stamp; ferroelectric thin film capacitors; flexible electronic systems; flexible nonvolatile memory applications; flexible plastic substrates; rigid wafers; sol-gel method; thin plastic substrate; voltage 3 V; well-saturated hysteresis loop; Capacitors; Electrodes; Encapsulation; Gold; Mechanical factors; Optical films; Plasma applications; Plastic films; Polyimides; Substrates; Ferroelectric; PZT; flexible electronics; nonvolatile memory;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2053344
Filename :
5512660
Link To Document :
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